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1. WO2020137935 - COMPOUND, (CO)POLYMER, COMPOSITION, PATTERN FORMING METHOD, AND COMPOUND PRODUCTION METHOD

Publication Number WO/2020/137935
Publication Date 02.07.2020
International Application No. PCT/JP2019/050261
International Filing Date 23.12.2019
IPC
C07C 33/46 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
33Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
40Halogenated unsaturated alcohols
46containing only six-membered aromatic rings as cyclic part
C07C 69/653 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
69Esters of carboxylic acids; Esters of carbonic or haloformic acids
62Halogen-containing esters
65of unsaturated acids
653Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
C08F 20/22 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
22Esters containing halogen
G03F 7/039 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
C07C 67/14 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
67Preparation of carboxylic acid esters
14from carboxylic acid halides
CPC
C07C 33/46
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
33Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
40Halogenated unsaturated alcohols
46containing only six-membered aromatic rings as cyclic parts
C07C 67/14
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
67Preparation of carboxylic acid esters
14from carboxylic acid halides
C07C 69/653
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
69Esters of carboxylic acids; Esters of carbonic or haloformic acids
62Halogen-containing esters
65of unsaturated acids
653Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
C08F 20/22
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
10Esters
22Esters containing halogen
G03F 7/039
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
Applicants
  • 三菱瓦斯化学株式会社 MITSUBISHI GAS CHEMICAL COMPANY, INC. [JP]/[JP]
Inventors
  • 大松 禎 OMATSU, Tadashi
  • 松本 正裕 MATSUMOTO, Masahiro
  • 由利 道裕 YURI, Michihiro
  • 片岡 健太郎 KATAOKA, Kentaro
  • 佐藤 隆 SATO, Takashi
  • 越後 雅敏 ECHIGO, Masatoshi
Agents
  • 稲葉 良幸 INABA, Yoshiyuki
  • 大貫 敏史 ONUKI, Toshifumi
  • 内藤 和彦 NAITO, Kazuhiko
Priority Data
2018-24450427.12.2018JP
2019-14431306.08.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) COMPOUND, (CO)POLYMER, COMPOSITION, PATTERN FORMING METHOD, AND COMPOUND PRODUCTION METHOD
(FR) COMPOSÉ, (CO)POLYMÈRE, COMPOSITION, PROCÉDÉ DE FORMATION DE MOTIF ET PROCÉDÉ DE PRODUCTION DE COMPOSÉ
(JA) 化合物、(共)重合体、組成物、パターン形成方法、及び化合物の製造方法
Abstract
(EN)
The objective of the present invention is to provide a composition, or the like, capable of forming a film having high definition and high sensitivity. The objective can be achieved by the following compound. The iodide-containing (meth)acrylate compound represented by general formula (1). (In formula (1): R1 represents a hydrogen atom, a methyl group, or a halogen; each of the R2 symbols independently represents a hydrogen atom, a linear organic group having 1 to 20 carbons, a branched organic group having 3 to 20 carbons, or a cyclic organic group having 3 to 20 carbons; A represents an organic group having 1 to 30 carbons; n1 represents 0 or 1; and n2 represents an integer from 1 to 20.)
(FR)
Le but de la présente invention est de fournir une composition, ou similaire, capable de former un film présentant une définition élevée et une haute sensibilité. La présente invention concerne le composé suivant. Le composé (méth)acrylate contenant de l'iodure est représenté par la formule générale (1). (Dans la formule (1) : R1 représente un atome d'hydrogène, un groupe méthyle ou un halogène ; chacun des symboles R2 représentant indépendamment un atome d'hydrogène, un groupe organique linéaire ayant de 1 à 20 atomes de carbone, un groupe organique ramifié ayant de 3 à 20 atomes de carbone, ou un groupe organique cyclique ayant de 3 à 20 atomes de carbone ; A représente un groupe organique ayant de 1 à 30 atomes de carbone ; n1 représente 0 ou 1 ; et n2 représente un nombre entier de 1 à 20.)
(JA)
本発明は、高解像度かつ高感度を有する膜を形成可能な組成物等を提供することを目的とする。前記目的は次の化合物によって達成することができる。一般式(1)で表される、ヨウ素含有(メタ)アクリレート化合物。(式(1)中、 Rは、水素原子、メチル基、又はハロゲンを表し、 Rは、それぞれ独立して、水素原子、炭素数1~20の直鎖状の有機基、炭素数3~20の分岐状の有機基、又は炭素数3~20の環状の有機基を表し、 Aは、炭素数1~30の有機基を表し、 nは0又は1を表し、 nは1~20の整数を表す。)
Also published as
JP2020563234
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