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1. WO2020137117 - METHOD FOR PRODUCING CYLINDRICAL SPUTTERING TARGET

Publication Number WO/2020/137117
Publication Date 02.07.2020
International Application No. PCT/JP2019/041241
International Filing Date 21.10.2019
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
CPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
Applicants
  • 三菱マテリアル株式会社 MITSUBISHI MATERIALS CORPORATION [JP]/[JP]
Inventors
  • 岡野 晋 OKANO Shin
  • 大友 健志 OHTOMO Takeshi
Agents
  • 松沼 泰史 MATSUNUMA Yasushi
  • 寺本 光生 TERAMOTO Mitsuo
  • 細川 文広 HOSOKAWA Fumihiro
  • 大浪 一徳 ONAMI Kazunori
Priority Data
2018-24235626.12.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METHOD FOR PRODUCING CYLINDRICAL SPUTTERING TARGET
(FR) PROCÉDÉ DE PRODUCTION D'UNE CIBLE CYLINDRIQUE DE PULVÉRISATION
(JA) 円筒型スパッタリングターゲットの製造方法
Abstract
(EN)
The method of the present invention has: an undercoating step for forming an undercoating layer by coating an undercoating bonding material on the inner surface of a target material and/or the outer surface of a backing tube; and a bonding step for inserting the backing tube inside the target material after the undercoating step and filling a filler bonding material in the gap between the target material and the backing tube. In the bonding step: a scraping plate that can be disposed so as to protrude radially in the gap is provided along the circumferential direction on one or both of the target material and the backing tube; and, with the undercoating layer heated so the surface thereof is in at least a half-melted state, the backing tube is inserted inside the target material while scraping the oxide film formed on the surface of the undercoating layer with the scraping plate.
(FR)
Le procédé de la présente invention comprend : une étape de sous-couche, permettant de former une sous-couche par enduction d'un matériau de liaison de sous-couche sur la surface interne d'un matériau cible et/ou sur la surface externe d'un tube de support ; et une étape de liaison, permettant d'insérer le tube de support à l'intérieur du matériau cible après l'étape de sous-couche et de remplir un matériau de liaison de charge dans l'espace séparant le matériau cible du tube de support. Lors de l'étape de liaison : une plaque de raclage, qui peut être disposée de manière à faire saillie radialement dans l'espace, est disposée le long de la direction circonférentielle sur le matériau cible et/ou sur le tube de support ; et, tandis que la sous-couche est chauffée pour que sa surface soit dans au moins un état semi-fondu, le tube de support est inséré à l'intérieur du matériau cible, pendant qu'on racle le film d'oxyde formé sur la surface de la sous-couche à l'aide de la plaque de raclage.
(JA)
ターゲット材の内周面とバッキングチューブの外周面との少なくとも何れか一方に下地処理接合材を塗布して下地処理層を形成する下地処理工程と、下地処理工程の後、ターゲット材内にバッキングチューブを挿入し、前記ターゲット材とバッキングチューブとの隙間に充填用接合材を充填する接合工程とを有し、前記接合工程において、ターゲット材或いはバッキングチューブの何れか一方又は双方に、隙間内に径方向に突出して配置可能な掻き取り板を周方向に沿って設けるとともに、下地処理層を加熱してその表面を少なくとも半溶融状態としておき、掻き取り板により下地処理層の表面に形成された酸化膜を掻き取りながらターゲット材内にバッキングチューブを挿入する。
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