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1. WO2020136697 - DEFECT INSPECTION DEVICE

Publication Number WO/2020/136697
Publication Date 02.07.2020
International Application No. PCT/JP2018/047448
International Filing Date 25.12.2018
Chapter 2 Demand Filed 19.07.2019
IPC
G01N 21/956 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws, defects or contamination
95characterised by the material or shape of the object to be examined
956Inspecting patterns on the surface of objects
G01N 21/88 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws, defects or contamination
CPC
G01N 21/88
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
G01N 21/956
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws or contamination
95characterised by the material or shape of the object to be examined
956Inspecting patterns on the surface of objects
Applicants
  • 株式会社日立ハイテク HITACHI HIGH-TECH CORPORATION [JP]/[JP]
Inventors
  • 有馬 英司 ARIMA Eiji
  • 本田 敏文 HONDA Toshifumi
  • 浦野 雄太 URANO Yuta
  • 松本 俊一 MATSUMOTO Shunichi
Agents
  • 青稜特許業務法人 SEIRYO I.P.C.
Priority Data
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) DEFECT INSPECTION DEVICE
(FR) DISPOSITIF D'INSPECTION DE DÉFAUT
(JA) 欠陥検査装置
Abstract
(EN)
The present invention comprises: an image formation part for forming a plurality of images, formed by partitioning an aperture, on a photoelectric conversion part at a magnification established for each image; and a signal processing unit for synthesizing the plurality of images formed on the photoelectric conversion unit to detect defects in a sample.
(FR)
La présente invention comprend : une partie de formation d'images servant à former une pluralité d'images, formées par partitionnement d'une ouverture, sur une partie de conversion photoélectrique à un grossissement établi pour chaque image ; et une unité de traitement de signaux servant à synthétiser la pluralité d'images formées sur l'unité de conversion photoélectrique pour détecter des défauts dans un échantillon.
(JA)
開口を分割して形成された複数の像を像ごとに定めた倍率で光電変換部上に結像する結像部と、光電変換部上に結像した複数の像を合成して試料の欠陥を検出する信号処理部を有する。
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