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1. WO2020135752 - POST-PROCESSING METHOD FOR QUANTUM DOTS

Publication Number WO/2020/135752
Publication Date 02.07.2020
International Application No. PCT/CN2019/129309
International Filing Date 27.12.2019
IPC
C09K 11/02 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11Luminescent, e.g. electroluminescent, chemiluminescent, materials
02Use of particular materials as binders, particle coatings or suspension media therefor
C09K 11/88 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
11Luminescent, e.g. electroluminescent, chemiluminescent, materials
08containing inorganic luminescent materials
88containing selenium, tellurium or unspecified chalcogen elements
CPC
C09K 11/02
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
11Luminescent, e.g. electroluminescent, chemiluminescent materials
02Use of particular materials as binders, particle coatings or suspension media therefor
C09K 11/88
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
11Luminescent, e.g. electroluminescent, chemiluminescent materials
08containing inorganic luminescent materials
88containing selenium, tellurium or unspecified chalcogen elements
Applicants
  • TCL科技集团股份有限公司 TCL TECHNOLOGY GROUP CORPORATION [CN]/[CN]
Inventors
  • 程陆玲 CHENG, Luling
  • 杨一行 YANG, Yixing
Agents
  • 深圳中一联合知识产权代理有限公司 SHENZHEN ZHONGYI UNION INTELLECTUAL PROPERTY AGENCY CO., LTD.
Priority Data
201811610993.927.12.2018CN
201811611004.827.12.2018CN
201811611010.327.12.2018CN
201811612473.127.12.2018CN
201811612495.827.12.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) POST-PROCESSING METHOD FOR QUANTUM DOTS
(FR) PROCÉDÉ DE POST-TRAITEMENT POUR POINTS QUANTIQUES
(ZH) 量子点的后处理方法
Abstract
(EN)
Disclosed is a post-processing method for quantum dots, comprising: providing an initial quantum dot solution; performing a first-order mixing and heating of the initial quantum dot solution with a first compound or a first compound combination to produce a first quantum dot solution; and performing a second-order mixing and heating of the first quantum dot solution with a second compound or a second compound combination to produce a second quantum dot solution.
(FR)
L'invention concerne un procédé de post-traitement pour points quantiques, comprenant : la fourniture d'une solution initiale de points quantiques ; la mise en œuvre, dans un premier ordre, du mélange et du chauffage de la solution initiale de points quantiques avec un premier composé ou une première combinaison de composés pour produire une première solution de points quantiques ; et la mise en œuvre, dans un second ordre, du mélange et du chauffage de la première solution de points quantiques avec un second composé ou une seconde combinaison de composés pour produire une seconde solution de points quantiques.
(ZH)
本申请公开一种量子点的后处理方法,包括:提供初始量子点溶液;将所述初始量子点溶液与第一化合物或第一化合物组合进行第一次序的混合并加热,得到第一量子点溶液;将所述第一量子点溶液与第二化合物或第二化合物组合进行第二次序的混合并加热,得到第二量子点溶液。
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