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1. WO2020135343 - FAST SCAN EXPOSURE METHOD BASED ON DMD

Publication Number WO/2020/135343
Publication Date 02.07.2020
International Application No. PCT/CN2019/127498
International Filing Date 23.12.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/2053
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2053using a laser
G03F 7/2057
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2057using an addressed light valve, e.g. a liquid crystal device
G03F 7/704
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
Applicants
  • 合肥芯碁微电子装备股份有限公司 CIRCUIT FABOLOGY MICROELECTRONICS EQUIPMENT CO., LTD. [CN]/[CN]
Inventors
  • 卞洪飞 BIAN, Hongfei
Agents
  • 北京景闻知识产权代理有限公司 JW&PARTNERS
Priority Data
201811588156.025.12.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) FAST SCAN EXPOSURE METHOD BASED ON DMD
(FR) PROCÉDÉ D'EXPOSITION À BALAYAGE RAPIDE BASÉ SUR UN DMD
(ZH) 一种基于DMD的快速扫描曝光方法
Abstract
(EN)
Disclosed is a fast scan exposure method based on DMD, comprising the following steps: S100, controlling light emitted from a laser (11) to irradiate onto DMD (12), enter into an object lens (13) after being reflected by DMD (12), and form image on photosensitive materials of a substrate (14) on a precision platform (15); S200, controlling the precision platform (15) to move at constant speed along a first direction and to equidistantly generate pulse signals in accordance with a preset step size for scanning, and then controlling the platform to move step-by-step along a second direction perpendicular to the first direction or not to move; S300, adjusting the angle of deflection of DMD micromirror during the time period after DMD (12) detects a refreshed pulse signal diagram and before DMD (12) detects a next pulse signal, so as to reflect the light emitted by the laser outside the object lens (13).
(FR)
La présente invention concerne un procédé d'exposition à balayage rapide basé sur un DMD, comprenant les étapes consistant à : S100, commander à la lumière émise par un laser (11) d'irradier un DMD (12), entrer dans une lentille d'objet (13) après avoir été réfléchie par le DMD (12) et former une image sur des matériaux photosensibles d'un substrat (14) sur une plate-forme de précision (15) ; S200, commander à la plate-forme de précision (15) de se déplacer à une vitesse constante le long d'une première direction et de générer de façon équidistante des signaux d'impulsion conformément à une taille de pas prédéfinie pour un balayage, puis commander à la plate-forme de se déplacer pas à pas le long d'une seconde direction perpendiculaire à la première direction ou de ne pas se déplacer ; S300, ajuster l'angle de déviation du micro-miroir du DMD pendant la période suivant la détection par le DMD (12) d'un diagramme de signal d'impulsion rafraîchi et précédant la détection par le DMD (12) d'un signal d'impulsion suivant, de façon à réfléchir la lumière émise par le laser à l'extérieur de la lentille d'objet (13).
(ZH)
一种基于DMD的快速扫描曝光方法,包括以下步骤:S100、控制激光器(11)发出的光照射至DMD(12),并经过DMD(12)反射后进入物镜(13),在精密平台(15)上的基板(14)上的感光材料成像;S200、控制精密平台(15)沿第一方向上匀速运动并按照设定的扫描步长等距产生脉冲信号,然后在垂直于第一方向的第二方向上步进运动或者不运动;S300、DMD(12)检测到脉冲信号刷新图形之后至检测到下一个脉冲信号之前调节DMD微镜的偏转角度,以将激光器发出的光反射至物镜(13)之外。
Also published as
EP19888237.5
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