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1. WO2020117123 - APERTURE DEVICE AND ANALYSER ARRANGEMENT

Publication Number WO/2020/117123
Publication Date 11.06.2020
International Application No. PCT/SE2019/051241
International Filing Date 06.12.2019
IPC
G01N 23/227 2018.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/-G01N17/178
22by measuring secondary emission from the material
227Measuring photoelectric effect , e.g. photoelectron emission microscopy
H01J 37/285 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
285Emission microscopes, e.g. field-emission microscopes
CPC
G01N 23/227
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00G01N17/00, G01N21/00 or G01N22/00
22by measuring secondary emission from the material
227Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
H01J 2237/0453
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
045Diaphragms
0451with fixed aperture
0453multiple apertures
H01J 2237/188
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
18Vacuum control means
188Differential pressure
H01J 2237/2605
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
2602Details
2605operating at elevated pressures, e.g. atmosphere
H01J 2237/2855
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
285Emission microscopes
2855Photo-emission
H01J 37/285
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
285Emission microscopes, e.g. field-emission microscopes
Applicants
  • SCIENTA OMICRON AB [SE]/[SE]
Inventors
  • AMANN, Peter
  • NILSSON, Anders
Agents
  • ZACCO SWEDEN AB
Priority Data
1851527-007.12.2018SE
1950445-509.04.2019SE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) APERTURE DEVICE AND ANALYSER ARRANGEMENT
(FR) DISPOSITIF D'OUVERTURE ET AGENCEMENT D'ANALYSEUR
Abstract
(EN)
An aperture device (31) is described which is attachable to a lens system (13) comprising a first end (36), and a second end (37) at a distance from the first end (36). The aperture device comprises an end surface wall (40) with an end surface (S) and an aperture means (39) comprising at least one aperture (38), wherein the aperture device (31) is to be arranged with the end surface (S) facing a sample surface (Ss) which emits particles from a region which is elongated along a first direction (a).The lens system (13) is arranged to form a particle beam of charged particles, emitted from the sample surface (Ss). The aperture means (39) in the end surface (S) is elongated along a second direction (b), wherein the aperture device (31) is to be arranged with the second direction (b) essentially aligned along the first direction (a) in order to maximize the number of particles that enter the aperture means (39).
(FR)
L'invention concerne un dispositif d'ouverture (31) pouvant être fixé à un système de lentille (13) comprenant une première extrémité (36), et une seconde extrémité (37) à une certaine distance de la première extrémité (36). Le dispositif d'ouverture comprend une paroi de surface d'extrémité (40) ayant une surface d'extrémité (S) et un moyen d'ouverture (39) comprenant au moins une ouverture (38), le dispositif d'ouverture (31) étant destiné à être agencé de sorte que la surface d'extrémité (S) soit située face à une surface d'échantillon (Ss) qui émet des particules à partir d'une région qui s'étend le long d'une première direction (a). Le système de lentilles (13) est agencé pour former un faisceau de particules chargées, émis à partir de la surface d'échantillon (Ss). Le moyen d'ouverture (39) dans la surface d'extrémité (S) s'étend le long d'une seconde direction (b), le dispositif d'ouverture (31) étant destiné à être agencé de sorte que la seconde direction (b) soit sensiblement alignée le long de la première direction (a) afin de maximiser le nombre de particules qui entrent dans le moyen d'ouverture (39).
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