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1. WO2020116397 - REPLICA MOLD FOR IMPRINTING AND METHOD FOR PRODUCING SAME

Publication Number WO/2020/116397
Publication Date 11.06.2020
International Application No. PCT/JP2019/047048
International Filing Date 02.12.2019
IPC
B32B 27/30 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27Layered products essentially comprising synthetic resin
30comprising vinyl resin; comprising acrylic resin
C08F 290/06 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
290Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
02on to polymers modified by introduction of unsaturated end groups
06Polymers provided for in subclass C08G52
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
B29C 33/38 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33Moulds or cores; Details thereof or accessories therefor
38characterised by the material or the manufacturing process
B29C 33/56 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33Moulds or cores; Details thereof or accessories therefor
56Coatings; Releasing, lubricating or separating agents
B29C 59/02 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59Surface shaping, e.g. embossing; Apparatus therefor
02by mechanical means, e.g. pressing
Applicants
  • 日産化学株式会社 NISSAN CHEMICAL CORPORATION [JP]/[JP]
Inventors
  • 小林 淳平 KOBAYASHI, Junpei
  • 加藤 拓 KATO, Taku
  • 長澤 偉大 NAGASAWA, Takehiro
Agents
  • 特許業務法人はなぶさ特許商標事務所 HANABUSA PATENT & TRADEMARK OFFICE
Priority Data
2018-22974707.12.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) REPLICA MOLD FOR IMPRINTING AND METHOD FOR PRODUCING SAME
(FR) MOULE DE RÉPLIQUE POUR EMPREINTE ET PROCÉDÉ DE PRODUCTION CORRESPONDANT
(JA) インプリント用レプリカモールド及びその作製方法
Abstract
(EN)
[Problem] To provide a novel replica mold for imprinting. [Solution] A replica mold for imprinting, which is provided with a layer A described below and a layer B described below, said layer B being bonded to the layer A. Layer A: a structure which is formed of a cured product of a composition that contains the following component (a1) and component (a2) Component (a1): a compound which has at least one radically polymerizable group in each molecule Component (a2): a radical photopolymerization initiator in an amount of from 0.01% by mass to 0.3% by mass relative to 100% by mass of the component (a1) Layer B: a film which is formed of a cured product of a composition that contains the following component (b1) and component (b2) Component (b1): a compound which is composed of a linear or chain-like molecular chain containing a fluorine atom, and which has a radically polymerizable group at all terminals of the molecular chain Component (b2): a radical photopolymerization initiator in an amount of from 0.05% by mass to 15% by mass relative to 100% by mass of the component (b1)
(FR)
Le problème décrit par la présente invention est de fournir un nouveau moule de réplique pour empreinte. La solution selon l'invention porte sur un moule de réplique pour empreinte, qui est pourvu d'une couche (A) décrite ci-dessous et d'une couche (B) décrite ci-dessous, ladite couche (B) étant liée à la couche (A). Couche (A) : une structure qui est formée d'un produit durci d'une composition qui contient le composant suivant (a1) et le composant suivant (a2). Composant (a1) : un composé qui a au moins un groupe polymérisable par voie radicalaire dans chaque molécule. Composant (a2) : un initiateur de photopolymérisation radicalaire à hauteur de 0,01 % en masse à 0,3 % en masse par rapport à 100 % en masse du composant (a1). Couche (B) : un film qui est formé d'un produit durci d'une composition qui contient le composant suivant (b1) et le composant suivant (b2). Composant (b1) : un composé qui est composé d'une chaîne moléculaire linéaire ou de type chaîne contenant un atome de fluor et qui a un groupe polymérisable par voie radicalaire à toutes les terminaisons de la chaîne moléculaire. Composant (b2) : un initiateur de photopolymérisation radicalaire à hauteur de 0,05 % en masse à 15 % en masse par rapport à 100 % en masse du composant (b1).
(JA)
【課題】 新規なインプリント用レプリカモールドを提供する。 【解決手段】 下記A層及び該A層に接着した下記B層を備えたインプリント用レプリカモールド。 A層:下記(a1)成分及び(a2)成分を含む組成物の硬化物から成る構造体 (a1)成分:ラジカル重合性基を1分子中に少なくとも1つ有する化合物 (a2)成分:前記(a1)成分100質量%に対し、0.01質量%乃至0.3質量%の光ラジカル重合開始剤 B層:下記(b1)成分及び(b2)成分を含む組成物の硬化物から成る膜 (b1)成分:フッ素原子を含む線状又は鎖状の分子鎖からなる化合物であって該分子鎖の全ての末端にラジカル重合性基を有する化合物 (b2)成分:前記(b1)成分100質量%に対し、0.05質量%乃至15質量%の光ラジカル重合開始剤
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