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1. WO2020115204 - METHOD FOR REPLACING A MIRROR IN A PROJECTION EXPOSURE APPARATUS, AND POSITION- AND ORIENTATION DATA MEASURING DEVICE FOR CARRYING OUT THE METHOD

Publication Number WO/2020/115204
Publication Date 11.06.2020
International Application No. PCT/EP2019/083811
International Filing Date 05.12.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70141
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
70141Illumination system adjustment, alignment during assembly of illumination system
G03F 7/7085
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • PETRI, Christoph
  • RUNDE, Daniel
  • BAUMER, Florian
  • MÜLLER, Ulrich
Agents
  • RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB
Priority Data
10 2018 221 128.006.12.2018DE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR REPLACING A MIRROR IN A PROJECTION EXPOSURE APPARATUS, AND POSITION- AND ORIENTATION DATA MEASURING DEVICE FOR CARRYING OUT THE METHOD
(FR) PROCÉDÉ DE REMPLACEMENT D'UN MIROIR DANS UN APPAREIL D'EXPOSITION PAR PROJECTION, ET DISPOSITIF DE MESURE DE POSITION ET D'ORIENTATION SERVANT À EFFECTUER LE PROCÉDÉ
Abstract
(EN)
When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position- and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, which should be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.
(FR)
Selon la présente invention, un miroir nécessitant un remplacement est initialement retiré (41) lors du remplacement d'un miroir dans un appareil d'exposition par projection. Des données de position et d'orientation du miroir retiré nécessitant le remplacement sont mesurées (43) par un dispositif de mesure de données de position et d'orientation. En outre, des données de position et d'orientation d'un miroir de remplacement devant être inséré à la place du miroir nécessitant le remplacement sont mesurées (46) à l'aide du dispositif de mesure de données de position et d'orientation. Des points d'appui du miroir de remplacement sont retravaillés (48) sur la base de différences déterminées entre, d'une part, les données de position et d'orientation du miroir nécessitant le remplacement, et, d'autre part, les données de position et d'orientation du miroir de remplacement. Le miroir de remplacement retravaillé est installé (54). Ceci permet d'obtenir un procédé de remplacement de miroir dans lequel une complexité d'ajustement du miroir de remplacement dans l'appareil d'exposition par projection est réduite.
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