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1. WO2020115090 - RAPID CROSS-LINKABLE NEUTRAL UNDERLAYERS FOR CONTACT HOLE SELF-ASSEMBLY OF POLYSTYRENE-B- POLY(METHYL METHACRYLATE) DIBLOCK COPOLYMERS AND THEIR FORMULATION THEREOF

Publication Number WO/2020/115090
Publication Date 11.06.2020
International Application No. PCT/EP2019/083589
International Filing Date 04.12.2019
IPC
C08F 220/14 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
12of monohydric alcohols or phenols
14Methyl esters
C09D 133/12 2006.01
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04Homopolymers or copolymers of esters
06of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
10Homopolymers or copolymers of methacrylic acid esters
12Homopolymers or copolymers of methyl methacrylate
CPC
C08F 220/14
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
12of monohydric alcohols or phenols
14Methyl esters ; , e.g. methyl (meth)acrylate
C09D 133/12
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04Homopolymers or copolymers of esters
06of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
10Homopolymers or copolymers of methacrylic acid esters
12Homopolymers or copolymers of methyl methacrylate
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
H01L 21/00
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applicants
  • MERCK PATENT GMBH [DE]/[DE]
Inventors
  • BASKARAN, Durairaj
  • RAHMAN, Md S.
  • MONREAL, Victor
Agents
  • RIPPEL, Hans Christoph
Priority Data
62/776,80207.12.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) RAPID CROSS-LINKABLE NEUTRAL UNDERLAYERS FOR CONTACT HOLE SELF-ASSEMBLY OF POLYSTYRENE-B- POLY(METHYL METHACRYLATE) DIBLOCK COPOLYMERS AND THEIR FORMULATION THEREOF
(FR) SOUS-COUCHES NEUTRES RAPIDEMENT RÉTICULABLES POUR AUTO-ASSEMBLAGE POUR TROUS DE CONTACT DE COPOLYMÈRES DIBLOCS POLYSTYRÈNE-B-POLY(MÉTHACRYLATE DE MÉTHYLE) ET LEUR FORMULATION
Abstract
(EN)
The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the use of said neutral layer composition to make a crosslinked neutral layer film on a substrate, which can enable self-assembly of a film of a block copolymer overlying said crosslinked neutral layer, wherein said block copolymer contains etch resistant and etchable block, and whose self-assembled pattern is used, through etching, to create either an array of contact holes or posts in said substrate.
(FR)
La présente invention concerne un copolymère statistique comprenant des motifs répétés de structure (I), (II), (III) et (IV). L'invention concerne également une composition de couche neutre constituée dudit copolymère statistique et concerne également l'utilisation de ladite composition de couche neutre pour fabriquer un film de couche neutre réticulé sur un substrat, qui peut permettre l'auto-assemblage d'un film d'un copolymère séquencé recouvrant ladite couche neutre réticulée, ledit copolymère séquencé contenant un bloc résistant à la gravure et pouvant être gravé, et dont le motif auto-assemblé est utilisé, par gravure, pour créer soit un réseau de trous de contact, soit des tiges dans ledit substrat.
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