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1. WO2020114763 - FLOW RESTRICTION, FLOW RESTRICTION ASSEMBLY AND LITHOGRAPHIC APPARATUS

Publication Number WO/2020/114763
Publication Date 11.06.2020
International Application No. PCT/EP2019/081738
International Filing Date 19.11.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
F15D 1/02 2006.01
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
15FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
DFLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
1Influencing the flow of fluids
02in pipes or conduits
CPC
F15D 1/02
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
15FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
DFLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOW OF GASES OR LIQUIDS
1Influencing flow of fluids
02in pipes or conduits
G03F 7/70858
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
G03F 7/709
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
709Vibration, e.g. vibration detection, compensation, suppression
G03F 7/70991
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus, shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate, utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids, vacuum
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • VAN ELTEN, Bas, Bastiaan, Cornelis, Gijsbertus
  • HABETS, Philippe, Jacqueline, Johannes, Hubertus, Anthonius
  • VAN DE MEERENDONK, Remco
Agents
  • VERHOEVEN, Johannes Theodorus Maria
Priority Data
18210707.806.12.2018EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) FLOW RESTRICTION, FLOW RESTRICTION ASSEMBLY AND LITHOGRAPHIC APPARATUS
(FR) RESTRICTION DE DÉBIT, ENSEMBLE DE RESTRICTION DE DÉBIT ET APPAREIL LITHOGRAPHIQUE
Abstract
(EN)
The present invention relates to a flow restriction (200), a flow restriction assembly (400) and methods for manufacturing the flow restriction and the flow restriction assembly. The flow restriction for use in a pipe (300) so as to restrict the flow of a fluid comprises a body extending along an axis (290) and comprising i) a centre portion (240) having a constant cross section, ii) an upstream portion (220), wherein the cross-sectional area of the upstream portion monotonically increases in a downstream direction along the axis; and iii) a downstream portion (260), wherein the cross-sectional area of the downstream portion monotonically decreases in the downstream direction. The flow restriction further comprises a plurality of centre portion projections (280) for engaging the inner surface of a pipe, each of which projects from the surface of the centre portion in a direction perpendicular to the surface of the centre portion by a distance of less than 500 microns.
(FR)
La présente invention concerne une restriction de débit (200), un ensemble de restriction de débit (400) et des procédés de fabrication de la restriction de débit et de l'ensemble de restriction de débit. La restriction de débit destinée à être utilisée dans un tuyau (300) de façon à restreindre le débit d'un fluide comprend un corps s'étendant le long d'un axe (290) et comprenant i) une partie centrale (240) dotée d'une section transversale constante, ii) une partie amont (220), la surface de section transversale de la partie amont augmentant de manière monotone dans une direction aval le long de l'axe, et iii) une partie aval (260), la surface de section transversale de la partie aval diminuant de façon monotone dans la direction aval. La restriction de débit comprend en outre une pluralité de saillies de partie centrale (280) destinées à venir en prise avec la surface interne d'un tuyau, chacune d'elles faisant saillie à partir de la surface de la partie centrale dans une direction perpendiculaire à la surface de la partie centrale et sur une distance inférieure à 500 microns.
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