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1. WO2020113749 - MANUFACTURING METHOD FOR OLED DISPLAY PANEL AND OLED DISPLAY PANEL

Publication Number WO/2020/113749
Publication Date 11.06.2020
International Application No. PCT/CN2019/070120
International Filing Date 02.01.2019
IPC
H01L 51/56 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
H01L 51/52 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
52Details of devices
CPC
H01L 51/5218
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes [OLED] or polymer light emitting devices [PLED]
52Details of devices
5203Electrodes
5206Anodes, i.e. with high work-function material
5218Reflective anodes, e.g. ITO combined with thick metallic layer
H01L 51/56
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes [OLED] or polymer light emitting devices [PLED]
56Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
Applicants
  • 武汉华星光电半导体显示技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 李镇石 LEE, Jinseok
Agents
  • 深圳翼盛智成知识产权事务所(普通合伙) ESSEN PATENT&TRADEMARK AGENCY
Priority Data
201811483050.405.12.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) MANUFACTURING METHOD FOR OLED DISPLAY PANEL AND OLED DISPLAY PANEL
(FR) PROCÉDÉ DE FABRICATION DE PANNEAU D'AFFICHAGE DELO ET PANNEAU D'AFFICHAGE DELO
(ZH) OLED 显示面板的制作方法及 OLED 显示面板
Abstract
(EN)
A manufacturing method for an OLED display panel, comprising: providing an array substrate; forming a first ITO layer, a reflective layer, and a second ITO layer in sequence on the array substrate, wherein the film thickness of the second ITO layer is greater than the film thickness of the first ITO layer; forming a patterned photoresist on the second ITO layer; etching the second ITO layer, the reflective layer, and the first ITO layer using the same etching process to form a patterned anode layer; and preparing an OLED light-emitting layer on the anode layer.
(FR)
L'invention concerne un procédé de fabrication d'un panneau d'affichage à diodes électroluminescentes organiques (DELO), consistant : à fournir un substrat matriciel ; à former une première couche ITO, une couche réfléchissante, et une seconde couche ITO en séquence sur le substrat matriciel, l'épaisseur de film de la seconde couche ITO étant supérieure à l'épaisseur de film de la première couche ITO ; à former une résine photosensible à motifs sur la seconde couche ITO ; à graver la seconde couche ITO, la couche réfléchissante et la première couche ITO à l'aide du même procédé de gravure pour former une couche d'anode à motifs ; et à préparer une couche électroluminescente DELO sur la couche d'anode.
(ZH)
一种OLED显示面板的制作方法,包括:提供阵列基板;在阵列基板上依次形成第一ITO层、反射层、第二ITO层,其中,所述第二ITO层的膜层厚度大于所述第一ITO层的膜层厚度;在第二ITO层上形成图案化的光刻胶;利用同一道刻蚀工艺对第二ITO层、反射层、第一ITO层进行刻蚀,以形成图案化的阳极层;在所述阳极层上制备OLED发光层。
Also published as
Latest bibliographic data on file with the International Bureau