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1. WO2020113680 - FILTER DEVICE AND PHOTORESIST SPREADING SYSTEM

Publication Number WO/2020/113680
Publication Date 11.06.2020
International Application No. PCT/CN2018/121893
International Filing Date 19.12.2018
IPC
B01D 36/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
36Filter circuits or combinations of filters with other separating devices
B05C 11/10 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
11Component parts, details or accessories not specifically provided for in groups B05C1/-B05C9/132
10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
G03F 7/16 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
CPC
B01D 36/00
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
36Filter circuits or combinations of filters with other separating devices
B05C 11/10
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
11Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
G03F 7/16
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
16Coating processes; Apparatus therefor
Applicants
  • 惠科股份有限公司 HKC CORPORATION LIMITED [CN]/[CN]
Inventors
  • 何怀亮 HE, Huailiang
Agents
  • 深圳市世纪恒程知识产权代理事务所 CENFO INTELLECTUAL PROPERTY AGENCY
Priority Data
201811478710.X04.12.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) FILTER DEVICE AND PHOTORESIST SPREADING SYSTEM
(FR) DISPOSITIF DE FILTRAGE ET SYSTÈME D'ÉTALEMENT DE RÉSINE PHOTOSENSIBLE
(ZH) 过滤装置和光阻涂布系统
Abstract
(EN)
A filter device and a photoresist spreading system. The filter device comprises: a liquid storage barrel (10) configured to hold a photoresist to be filtered; a stirring structure (20) comprising a stirring barrel (21) and a stirring assembly (22) at least partially accommodated in the stirring barrel; a first pipeline (31), wherein one end of the first pipeline (31) communicates with the liquid storage barrel (10), and the other end of the first pipeline (31) communicates with the stirring barrel (21); a first filter assembly (40) provided on the first pipeline (31) and located between the liquid storage barrel (10) and the stirring barrel (21); a first pressure measurement assembly (50) provided on the first pipeline (31) and configured to measure the pressure of the photoresist in the first pipeline (31); and a second pipeline (32), wherein one end of the second pipeline (32) communicates with the stirring barrel (21), and the other end of the second pipeline (32) is connected to a spreading device (300).
(FR)
L'invention concerne également un dispositif de filtrage et un système d'étalement de résine photosensible. Le dispositif de filtrage comprend : un cylindre de stockage de liquide (10) configuré pour contenir une résine photosensible à filtrer; une structure d'agitation (20) comprenant un cylindre d'agitation (21) et un ensemble d'agitation (22) logé au moins partiellement dans le cylindre d'agitation; un premier pipeline (31), une extrémité du premier pipeline (31) communiquant avec le cylindre de stockage de liquide (10), et l'autre extrémité du premier pipeline (31) communiquant avec le cylindre d'agitation (21); un premier ensemble filtrant (40) disposée sur le premier pipeline (31) et située entre le cylindre de stockage de liquide (10) et le cylindre d'agitation (21); un premier ensemble de mesure de pression (50) disposé sur le premier pipeline (31) et configuré pour mesurer la pression de la résine photosensible dansle premier pipeline (31); et un second pipeline (32), une extrémité du second pipeline (32) communiquant avec le cylindre d'agitation (21), et l'autre extrémité du second pipeline (32) étant reliée à un dispositif d'étalement (300).
(ZH)
一种过滤装置和光阻涂布系统,该过滤装置包括:储液桶(10),设置为盛放待过滤光阻剂;搅拌结构(20),包括搅拌桶(21)、及至少部分容纳搅拌桶内的搅拌组件(22);第一管路(31),第一管路(31)的一端连通储液桶(10),第一管路(31)的另一端连通搅拌桶(21);第一过滤组件(40),设于第一管路(31),并位于储液桶(10)和搅拌桶(21)之间;第一压力检测组件(50),设于第一管路(31),设置为检测第一管路(31)内光阻剂的压力;及第二管路(32),第二管路(32)的一端连通搅拌桶(21),第二管路(32)的另一端连接于涂布装置(300)。
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