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1. WO2020111432 - HEAT RESISTANT LAYER COMPOSITION, LITHIUM SECONDARY BATTERY SEPARATOR COMPRISING HEAT RESISTANT LAYER FORMED THEREFROM, AND LITHIUM SECONDARY BATTERY COMPRISING SAME

Publication Number WO/2020/111432
Publication Date 04.06.2020
International Application No. PCT/KR2019/008782
International Filing Date 16.07.2019
IPC
C08L 33/26 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
24Homopolymers or copolymers of amides or imides
26Homopolymers or copolymers of acrylamide or methacrylamide
C08L 33/02 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
C08L 33/08 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04Homopolymers or copolymers of esters
06of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
08Homopolymers or copolymers of acrylic acid esters
C08L 33/20 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
18Homopolymers or copolymers of nitriles
20Homopolymers or copolymers of acrylonitrile
C08F 220/56 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
52Amides or imides
54Amides
56Acrylamide; Methacrylamide
C08F 220/06 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
04Acids; Metals salts or ammonium salts thereof
06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
CPC
C08F 220/06
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
04Acids; Metal salts or ammonium salts thereof
06Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
C08F 220/18
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
12of monohydric alcohols or phenols
16of phenols or of alcohols containing two or more carbon atoms
18with acrylic or methacrylic acids
C08F 220/46
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
42Nitriles
44Acrylonitrile
46with carboxylic acids, sulfonic acids or salts thereof
C08F 220/56
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
52Amides or imides
54Amides ; , e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
56Acrylamide; Methacrylamide
C08K 5/0025
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUse of inorganic or non-macromolecular organic substances as compounding ingredients
5Use of organic ingredients
0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
0025Crosslinking or vulcanising agents; including accelerators
C08L 33/02
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
02Homopolymers or copolymers of acids; Metal or ammonium salts thereof
Applicants
  • 삼성에스디아이 주식회사 SAMSUNG SDI CO., LTD. [KR]/[KR]
Inventors
  • 최연주 CHOI, Yeonjoo
  • 김가인 KIM, Gain
  • 김양섭 KIM, Yangseob
  • 김용경 KIM, Yongkyoung
  • 이정윤 LEE, Jungyoon
Agents
  • 팬코리아특허법인 PANKOREA PATENT AND LAW FIRM
Priority Data
10-2018-014972028.11.2018KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) HEAT RESISTANT LAYER COMPOSITION, LITHIUM SECONDARY BATTERY SEPARATOR COMPRISING HEAT RESISTANT LAYER FORMED THEREFROM, AND LITHIUM SECONDARY BATTERY COMPRISING SAME
(FR) COMPOSITION DE COUCHE RÉSISTANTE À LA CHALEUR, SÉPARATEUR DE BATTERIE SECONDAIRE AU LITHIUM COMPRENANT UNE COUCHE RÉSISTANTE À LA CHALEUR FORMÉE À PARTIR DE CETTE DERNIÈRE, ET BATTERIE SECONDAIRE AU LITHIUM LA COMPRENANT
(KO) 내열층 조성물, 이로부터 형성된 내열층을 포함하는 리튬 이차 전지용 분리막 및 이를 포함하는 리튬 이차 전지
Abstract
(EN)
The present invention relates to: a heat resistant layer composition; a heat resistant layer formed therefrom; and a lithium secondary battery separator and a lithium secondary battery which comprise same, the heat resistant layer composition comprising: an acrylic copolymer comprising a first structural unit, which is derived from (meth)acrylamide, and a second structural unit, which comprises at least one from among a structural unit derived from (meth)acrylic acid or a (meth)acrylate, a structural unit derived from (meth)acrylonitrile and a structural unit derived from (meth)acrylamidosulfonic acid or a salt thereof; a cross-linking agent containing at least one functional group from among an aldehyde group, an epoxy group, an amide group, an imide group, an amine group and a silane-based group; and a solvent.
(FR)
La présente invention concerne : une composition de couche résistante à la chaleur ; une couche résistante à la chaleur formée à partir de cette dernière ; et un séparateur de batterie secondaire au lithium et une batterie secondaire au lithium qui les comprennent, la composition de couche résistante à la chaleur comprenant : un copolymère acrylique comprenant un premier motif structural, qui est dérivé d'un (méth)acrylamide, et un second motif structural, qui comprend au moins un élément parmi un motif structural dérivé d'un acide (méth)acrylique ou d'un (méth)acrylate, un motif structural dérivé d'un (méth)acrylonitrile et un motif structural dérivé d'un acide (méth)acrylamidosulfonique ou d'un sel de ce dernier ; un agent de réticulation contenant au moins un groupe fonctionnel parmi un groupe aldéhyde, un groupe époxy, un groupe amide, un groupe imide, un groupe amine et un groupe à base de silane ; et un solvant.
(KO)
(메타)아크릴아마이드로부터 유도되는 제1 구조단위, 그리고 (메타)아크릴산 또는 (메타)아크릴레이트로부터 유도되는 구조단위, (메타)아크릴로니트릴로부터 유도되는 구조단위 및 (메타)아크릴아미도술폰산 또는 그 염으로부터 유도되는 구조단위 중 적어도 하나를 포함하는 제2 구조단위를 포함하는 아크릴계 공중합체; 알데히드기, 에폭시기, 아마이드기, 이미드기, 아민기 및 실란계 중 적어도 하나의 관능기를 포함하는 가교제; 및 용매를 포함하는 내열층 조성물, 이로부터 형성되는 내열층 및 이를 포함하는 리튬 이차 전지용 분리막 및 리튬 이차 전지에 관한 것이다.
Also published as
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