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1. WO2020111013 - WAFER STOCKER

Publication Number WO/2020/111013
Publication Date 04.06.2020
International Application No. PCT/JP2019/046033
International Filing Date 25.11.2019
IPC
H01L 21/673 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
673using specially adapted carriers
CPC
H01L 21/673
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
673using specially adapted carriers ; or holders; Fixing the workpieces on such carriers or holders
Applicants
  • シンフォニアテクノロジー株式会社 SINFONIA TECHNOLOGY CO., LTD. [JP]/[JP]
Inventors
  • 谷山 育志 TANIYAMA, Yasushi
  • 河合 俊宏 KAWAI, Toshihiro
Agents
  • 特許業務法人梶・須原特許事務所 KAJI, SUHARA & ASSOCIATES
Priority Data
2018-22288328.11.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) WAFER STOCKER
(FR) DISPOSITIF DE STOCKAGE DE TRANCHES
(JA) ウェーハストッカ
Abstract
(EN)
Provided is a wafer stocker that can further improve the atmosphere around a wafer. A wafer stocker X includes a housing 1, a loading device 2 provided on a front surface of the housing 1, a wafer cassette shelf 3 provided in the housing 1, a wafer transfer robot 4 for transferring wafers into and out of a wafer cassette C on the wafer cassette shelf 3 from a transfer container mounted on the loading device 2, a wafer cassette transfer device 5 for moving the wafer cassette C on the wafer cassette shelf 3 to different heights, and a fan filter unit 8 for generating a laminar flow in a wafer transfer space and a wafer cassette transfer space.
(FR)
L'invention concerne un dispositif de stockage de tranches qui peut améliorer davantage l'atmosphère autour d'une tranche. Un dispositif de stockage de tranches (X) comprend : un boîtier (1) ; un dispositif de chargement (2) disposé sur une surface avant du boîtier (1) ; une étagère de cassette de tranches (3) disposée dans le boîtier (1) ; un robot de transfert de tranches (4) servant à transférer des tranches dans une cassette de tranches (C) et hors de cette dernière sur l'étagère de cassette de tranches (3) depuis un conteneur de transfert monté sur le dispositif de chargement (2) ; un dispositif de transfert de cassette de tranches (5) servant à déplacer la cassette de tranches (C) sur l'étagère de cassette de tranches (3) à des hauteurs différentes ; et une unité de filtre de ventilateur (8) servant à générer un écoulement laminaire dans un espace de transfert de tranches et un espace de transfert de cassette de tranches.
(JA)
ウェーハの周囲の雰囲気をより改善可能なウェーハストッカを提供する。 ウェーハストッカXは、筐体1と、筐体1の前面に設けられたローディング装置2と、筐体1内に設けられたウェーハカセット棚3と、ローディング装置2に載置された搬送容器からウェーハカセット棚3のウェーハカセットCにウェーハを出し入れするウェーハ搬送ロボット4と、ウェーハカセット棚3のウェーハカセットCを異なる高さの段に移動させるウェーハカセット移載装置5と、ウェーハ搬送空間及びウェーハカセット搬送空間に層流を発生させるファンフィルタユニット8と、を備える。
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