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1. WO2020110734 - PLASMA-USING PROCESSING DEVICE AND PRODUCTION METHOD FOR PRODUCING HYDROGEN GENERATING MATERIAL USING SAME PROCESSING DEVICE

Publication Number WO/2020/110734
Publication Date 04.06.2020
International Application No. PCT/JP2019/044576
International Filing Date 13.11.2019
IPC
B01J 19/08 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
C01B 3/06 2006.01
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF
3Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
02Production of hydrogen or of gaseous mixtures containing hydrogen
06by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
C01B 6/04 2006.01
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF
6Hydrides of metals; Monoborane or diborane; Addition complexes thereof
04Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
H05H 1/46 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
CPC
B01J 19/08
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
19Chemical, physical or physico-chemical processes in general; Their relevant apparatus
08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
C01B 3/06
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; ; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
3Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it
02Production of hydrogen or of gaseous mixtures containing ; a substantial proportion of; hydrogen
06by reaction of inorganic compounds containing electro-positively bound hydrogen, e.g. water, acids, bases, ammonia, with inorganic reducing agents
C01B 6/04
CCHEMISTRY; METALLURGY
01INORGANIC CHEMISTRY
BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; ; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
6Hydrides of metals ; including fully or partially hydrided metals, alloys or intermetallic compounds
04Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
H05H 1/46
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
1Generating plasma; Handling plasma
24Generating plasma
46using applied electromagnetic fields, e.g. high frequency or microwave energy
Applicants
  • 株式会社エスイー SE CORPORATION [JP]/[JP]
Inventors
  • 滝沢 力 TAKIZAWA Tsutomu
  • 白根 崇 SHIRANE Takashi
  • 森元 峯夫 MORIMOTO Mineo
  • 坂本 雄一 SAKAMOTO Yuichi
Agents
  • 特許業務法人サカモト・アンド・パートナーズ SAKAMOTO & PARTNERS
Priority Data
2018-22132827.11.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PLASMA-USING PROCESSING DEVICE AND PRODUCTION METHOD FOR PRODUCING HYDROGEN GENERATING MATERIAL USING SAME PROCESSING DEVICE
(FR) DISPOSITIF DE TRAITEMENT UTILISANT UN PLASMA ET PROCÉDÉ DE PRODUCTION POUR PRODUIRE UN MATÉRIAU GÉNÉRANT DE L'HYDROGÈNE À L'AIDE DUDIT DISPOSITIF DE TRAITEMENT
(JA) プラズマを用いた処理装置及びその処理装置を用いて水素発生材料を製造する製造方法
Abstract
(EN)
In order to provide, for example, a plasma-using processing device that is suited for producing, through a comparatively low temperature process, a hydrogen generating material containing magnesium hydride, the plasma-using processing device (10) of the present invention comprises: a processing chamber (11) wherein plasma is irradiated onto a raw material; a raw material supply unit (12) supplying the raw material in a suspended state in the plasma; a gas supply unit (13) supplying a reactive gas to be turned into the plasma and reacted with the raw material; a microwave supply unit (14) supplying microwaves for the purpose of generating the plasma; and a dielectric window (15) for allowing microwaves to pass therethrough and be introduced into the processing chamber (11), wherein the microwave supply unit (14) generates microwaves supplied through the window (15) into the processing chamber (11) that at least have a peak microwave electric power of 2.0 kilowatts or higher.
(FR)
Afin de fournir, par exemple, un dispositif de traitement utilisant du plasma qui est approprié pour produire, par un processus à température comparativement basse, un matériau générant de l'hydrogène contenant de l'hydrure de magnésium, le dispositif de traitement utilisant le plasma (10) de la présente invention comprend : une chambre de traitement (11) dans laquelle un plasma est irradié sur une matière première; une unité d'alimentation en matière première (12) fournissant la matière première dans un état suspendu dans le plasma; une unité d'alimentation en gaz (13) fournissant un gaz réactif à être transformé en plasma et mis à réagir avec la matière première; une unité d'alimentation en micro-ondes (14) fournissant des micro-ondes dans le but de générer le plasma; et une fenêtre diélectrique (15) pour permettre au micro-ondes de passer à travers celle-ci et être introduite dans la chambre de traitement (11), l'unité d'alimentation en micro-ondes (14) générant des micro-ondes fournies à travers la fenêtre (15) dans la chambre de traitement (11) qui ont au moins une puissance électrique de micro-ondes de pic de 2,0 kilowatts ou plus.
(JA)
例えば、水素化マグネシウムを含む水素発生材料を比較的低温なプロセスで製造するのに適したプラズマを用いた処理装置を提供するために、本発明のプラズマを用いた処理装置(10)は、原料にプラズマを照射する処理室(11)と、プラズマ中に原料を浮遊状態で供給する原料供給部(12)と、プラズマ化して原料に反応させる反応性ガスを供給するガス供給部(13)と、プラズマを生成させるためのマイクロ波を供給するマイクロ波供給部(14)と、処理室(11)に導入するマイクロ波を通す誘電体の窓(15)と、を備え、マイクロ波供給部(14)は、少なくとも窓(15)を通して処理室(11)内に供給されるマイクロ波のマイクロ波電力のピーク値が2.0キロワット以上となるマイクロ波を発生する。
Also published as
Latest bibliographic data on file with the International Bureau