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1. WO2020110376 - DEGRADABLE RESIN MOLDING AND PRODUCTION METHOD FOR DEGRADABLE RESIN MOLDING

Publication Number WO/2020/110376
Publication Date 04.06.2020
International Application No. PCT/JP2019/031539
International Filing Date 09.08.2019
IPC
B32B 27/30 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27Layered products essentially comprising synthetic resin
30comprising vinyl resin; comprising acrylic resin
B32B 9/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C08J 7/06 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
7Chemical treatment or coating of shaped articles made of macromolecular substances
04Coating
06with compositions not containing macromolecular substances
C23C 16/42 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42Silicides
C23C 16/44 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44characterised by the method of coating
CPC
B05D 3/04
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
3Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
04by exposure to gases
B05D 7/04
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
7Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
02to macromolecular substances, e.g. rubber
04to surfaces of films or sheets
B32B 27/30
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
27Layered products comprising ; a layer of; synthetic resin
30comprising vinyl ; (co)polymers; comprising acrylic (co)polymers
B32B 9/00
BPERFORMING OPERATIONS; TRANSPORTING
32LAYERED PRODUCTS
BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9Layered products comprising a particular substance not covered by groups B32B11/00 - B32B29/00
C08J 7/06
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G
7Chemical treatment or coating of shaped articles made of macromolecular substances
04Coating
06with compositions not containing macromolecular substances
C23C 16/42
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
42Silicides
Applicants
  • 株式会社明電舎 MEIDENSHA CORPORATION [JP]/[JP]
Inventors
  • 三浦 敏徳 MIURA, Toshinori
  • 花倉 満 KEKURA, Mitsuru
  • 亀田 直人 KAMEDA, Naoto
Agents
  • 小林 博通 KOBAYASHI, Hiromichi
  • 富岡 潔 TOMIOKA, Kiyoshi
  • 鵜澤 英久 UZAWA, Hidehisa
  • 太田 友幸 OTA, Tomoyuki
Priority Data
2018-22508230.11.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) DEGRADABLE RESIN MOLDING AND PRODUCTION METHOD FOR DEGRADABLE RESIN MOLDING
(FR) MOULAGE DE RÉSINE DÉGRADABLE ET PROCÉDÉ DE PRODUCTION DESTINÉ AU MOULAGE DE RÉSINE DÉGRADABLE
(JA) 分解性樹脂成形体および分解性樹脂成形体の製造方法
Abstract
(EN)
A degradable resin film (1) has a barrier layer (3) disposed on top of a water-soluble polymer layer (2). The water-soluble polymer layer (2) is formed of a water-soluble polymer such as polyvinyl alcohol or polyvinyl pyrrolidone. The barrier layer (3) is formed of a silicon oxide or a silicon oxynitride. The barrier layer (3) is formed on top of the water-soluble polymer layer (2) through CVD by supplying, to the water-soluble polymer layer (2), a material gas containing a precursor of a material that forms the barrier layer (3), at least 20 vol% of ozone gas, and an unsaturated hydrocarbon gas.
(FR)
L'invention concerne un film de résine dégradable (1) comportant une couche barrière (3) disposée sur une couche de polymère hydrosoluble (2). La couche de polymère hydrosoluble (2) est composée d'un polymère hydrosoluble tel que l'alcool polyvinylique ou la polyvinylpyrrolidone. La couche barrière (3) est composée d'un oxyde de silicium ou d'un oxynitrure de silicium. La couche barrière (3) est formée sur la couche de polymère hydrosoluble (2) au moyen d'un DCPV par fourniture, à la couche de polymère hydrosoluble (2), d'une substance gazeuse contenant un précurseur d'une substance qui compose la couche barrière (3), d'au moins 20 % en volume d'ozone gazeux, et d'un gaz hydrocarboné insaturé.
(JA)
水溶性高分子層(2)上にバリア層(3)を備えた分解性フィルム(1)である。水溶性高分子層(2)は、ポリビニルアルコールまたはポリビニルピロリドン等の水溶性高分子で形成する。バリア層(3)は、ケイ素酸化物またはケイ素酸窒化物で形成する。水溶性高分子層(2)に、バリア層(3)を形成する物質の前駆体を含む原料ガス、20体積%以上のオゾンガスおよび不飽和炭化水素ガスを供給して、CVDにより水溶性高分子層(2)上にバリア層(3)を形成する。
Also published as
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