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1. WO2020110276 - CHARGED PARTICLE BEAM APPARATUS

Publication Number WO/2020/110276
Publication Date 04.06.2020
International Application No. PCT/JP2018/044109
International Filing Date 30.11.2018
IPC
H01J 37/20 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/22 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
22Optical or photographic arrangements associated with the tube
H01L 21/66 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66Testing or measuring during manufacture or treatment
CPC
H01J 37/20
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/22
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
22Optical or photographic arrangements associated with the tube
Applicants
  • 株式会社日立ハイテク HITACHI HIGH-TECH CORPORATION [JP]/[JP]
Inventors
  • 三羽 貴文 MIWA Takafumi
  • 菅野 誠一郎 KANNO Seiichiro
  • 宮 豪 MIYA Go
Agents
  • ポレール特許業務法人 POLAIRE I.P.C.
Priority Data
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) CHARGED PARTICLE BEAM APPARATUS
(FR) APPAREIL À FAISCEAU DE PARTICULES CHARGÉES
(JA) 荷電粒子線装置
Abstract
(EN)
Provided is a charged particle beam apparatus with which it is possible to analyze foreign matter generated during transfer, observation, etc., of a sample. This charged particle beam apparatus is provided with: a sample stage on which a sample to be measured is placed; a charged particle beam source for irradiating the to-be-measured sample with a charged particle beam; and a detector for detecting charged particles emitted as a result of irradiation with the charged particle beam. The charged particle beam apparatus is characterized by being also provided with: a sample used for foreign matter observation, which, along with the to-be-measured sample, is held on the sample stage; and a foreign matter observation unit for observing foreign matter on the sample used for foreign matter observation.
(FR)
L'invention concerne un appareil à faisceau de particules chargées grâce auquel il est possible d'analyser de la matière étrangère générée durant le transfert, l'observation, etc. d'un échantillon. Cet appareil à faisceau de particules chargées comporte : un étage d'échantillons sur lequel est placé un échantillon à mesurer; une source de faisceau de particules chargées destinée à irradier l'échantillon à mesurer avec un faisceau de particules chargées; et un détecteur destiné à détecter des particules chargées transmises en résultat de l'irradiation avec le faisceau de particules chargées. L'appareil à faisceau de particules chargées est caractérisé en ce qu'il comporte également : un échantillon utilisé pour l'observation de matière étrangère, lequel, en même temps que l'échantillon à mesurer, est maintenu sur l'étage d'échantillons; et une unité d'observation de matière étrangère destinée à observer la matière étrangère sur l'échantillon utilisé pour l'observation de matière étrangère.
(JA)
試料を搬送するときや観察しているとき等に発生する異物を解析可能にする荷電粒子線装置を提供する。測定用試料が設置される試料ステージと、前記測定用試料に荷電粒子線を照射する荷電粒子線源と、前記荷電粒子線の照射によって放出される荷電粒子を検出する検出器と、を備える荷電粒子線装置であって、前記測定用試料とともに前記試料ステージに保持される異物観察用試料と、前記異物観察用試料の上の異物を観察する異物観察部と、を備えることを特徴とする。
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