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1. WO2020109816 - MULTIPLE-GATE TRANSISTOR

Publication Number WO/2020/109816
Publication Date 04.06.2020
International Application No. PCT/GB2019/053383
International Filing Date 29.11.2019
IPC
H01L 29/786 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof
66Types of semiconductor device
68controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified, or switched
76Unipolar devices
772Field-effect transistors
78with field effect produced by an insulated gate
786Thin-film transistors
H01L 51/05 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
CPC
H01L 29/78645
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; ; Multistep manufacturing processes therefor
66Types of semiconductor device ; ; Multistep manufacturing processes therefor
68controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
76Unipolar devices ; , e.g. field effect transistors
772Field effect transistors
78with field effect produced by an insulated gate
786Thin film transistors, ; i.e. transistors with a channel being at least partly a thin film
78645with multiple gate
H01L 29/78672
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; ; Multistep manufacturing processes therefor
66Types of semiconductor device ; ; Multistep manufacturing processes therefor
68controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
76Unipolar devices ; , e.g. field effect transistors
772Field effect transistors
78with field effect produced by an insulated gate
786Thin film transistors, ; i.e. transistors with a channel being at least partly a thin film
78651Silicon transistors
7866Non-monocrystalline silicon transistors
78672Polycrystalline or microcrystalline silicon transistor
H01L 29/78681
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; ; Multistep manufacturing processes therefor
66Types of semiconductor device ; ; Multistep manufacturing processes therefor
68controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
76Unipolar devices ; , e.g. field effect transistors
772Field effect transistors
78with field effect produced by an insulated gate
786Thin film transistors, ; i.e. transistors with a channel being at least partly a thin film
78681having a semiconductor body comprising AIIIBV or AIIBVI or AIVBVI semiconductor materials, or Se or Te
H01L 29/78693
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; ; Multistep manufacturing processes therefor
66Types of semiconductor device ; ; Multistep manufacturing processes therefor
68controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
76Unipolar devices ; , e.g. field effect transistors
772Field effect transistors
78with field effect produced by an insulated gate
786Thin film transistors, ; i.e. transistors with a channel being at least partly a thin film
7869having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
78693the semiconducting oxide being amorphous
H01L 51/0554
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05specially adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential- jump barrier or surface barrier ; multistep processes for their manufacture
0504the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or swiched, e.g. three-terminal devices
0508Field-effect devices, e.g. TFTs
0512insulated gate field effect transistors
055characterised by the gate conductor
0554the transistor having two or more gate electrodes
Applicants
  • UNIVERSITY OF SURREY [GB]/[GB]
Inventors
  • SPOREA, Radu Alexandru
  • BESTELINK, Eva
Agents
  • CORK, Robert
Priority Data
1819570.130.11.2018GB
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MULTIPLE-GATE TRANSISTOR
(FR) TRANSISTOR À GRILLES MULTIPLES
Abstract
(EN)
A multiple-gate transistor is disclosed, comprising a source, a drain spaced apart from the source, a semiconductor region disposed between the source and the drain, and an insulating region disposed over the semiconductor region. The multiple-gate transistor further comprises a current control gate for controlling a magnitude of current flowing between the source and the drain through the semiconductor region in dependence on a first electric field applied to the current control gate, the current control gate being separated from the source by the semiconductor region and the insulating region, and a switching gate for permitting current to flow between the source and the drain through the semiconductor region in dependence on a second electric field applied to the switching gate. The conduction state of the transistor (i.e. on/off) can be controlled by varying the second electric field that is applied to the switching gate, whilst the magnitude of the current through the multiple-gate transistor can be set by varying the first electric field that is applied to the current control gate.
(FR)
L'invention concerne un transistor à grilles multiples, comprenant une source, un drain espacé de la source, une région semi-conductrice disposée entre la source et le drain, et une région isolante disposée sur la région semi-conductrice. Le transistor à grilles multiples comprend en outre une grille de commande de courant permettant de commander une amplitude de courant circulant entre la source et le drain à travers la région semi-conductrice en fonction d'un premier champ électrique appliqué à la grille de commande de courant, la grille de commande de courant étant séparée de la source par la région semi-conductrice et la région isolante, et une grille de commutation destinée à permettre au courant de circuler entre la source et le drain à travers la région semi-conductrice en fonction d'un second champ électrique appliqué à la grille de commutation. L'état de conduction du transistor (c'est-à-dire marche/arrêt) peut être commandé en faisant varier le second champ électrique qui est appliqué à la grille de commutation, tandis que l'amplitude du courant à travers le transistor à grilles multiples peut être réglée en faisant varier le premier champ électrique qui est appliqué à la grille de commande de courant.
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