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1. WO2020109225 - MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS COMPRISING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE AND METHOD FOR PRODUCING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE ON A MIRROR

Publication Number WO/2020/109225
Publication Date 04.06.2020
International Application No. PCT/EP2019/082407
International Filing Date 25.11.2019
IPC
G02B 5/08 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
G02B 27/42 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/-G02B26/119
42Diffraction optics
G02B 5/18 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffracting gratings
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 27/425
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
42Diffraction optics ; , i.e. systems including a diffractive element being designed for providing a diffractive effect
4233having a diffractive element [DOE] contributing to a non-imaging application
425in illumination systems
G02B 5/0891
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
08Mirrors
0891Ultraviolet [UV] mirrors
G02B 5/1861
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
18Diffraction gratings
1861Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
G03F 7/70058
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
G03F 7/702
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
702Reflective illumination, i.e. reflective optical elements other than folding mirrors
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • JALICS, Christof
  • SCHUSTER, Fabian
  • KIEREY, Holger
  • SANDNER, Andreas
  • MEISCH, Tobias
Agents
  • RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB
Priority Data
10 2018 220 629.529.11.2018DE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS COMPRISING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE AND METHOD FOR PRODUCING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE ON A MIRROR
(FR) MIROIR POUR UNE UNITÉ OPTIQUE D'ÉCLAIRAGE D'UN APPAREIL D'EXPOSITION PAR PROJECTION COMPRENANT UN FILTRE SPECTRAL SOUS LA FORME D'UNE STRUCTURE DE RÉSEAU ET PROCÉDÉ DE PRODUCTION D'UN FILTRE SPECTRAL SOUS LA FORME D'UNE STRUCTURE DE RÉSEAU SUR UN MIROIR
Abstract
(EN)
A mirror for an illumination optical unit (4) of a projection exposure apparatus (1) comprises a spectral filter in the form of a grating structure (30), wherein the grating structure (30) has a maximum edge steepness (b) in the range of 15° to 60°.
(FR)
L'invention concerne un miroir destiné à une unité optique d'éclairage (4) d'un appareil d'exposition par projection (1) qui comprend un filtre spectral sous la forme d'une structure de réseau (30), la structure de réseau (30) ayant une pente de bord maximale (b) dans la plage de 15° à 60°.
Also published as
Latest bibliographic data on file with the International Bureau