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1. WO2020109152 - MEMBRANE CLEANING APPARATUS

Publication Number WO/2020/109152
Publication Date 04.06.2020
International Application No. PCT/EP2019/082184
International Filing Date 22.11.2019
IPC
G03F 1/62 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G03F 1/82 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68Preparation processes not covered by groups G03F1/20-G03F1/5096
82Auxiliary processes, e.g. cleaning
CPC
G03F 1/62
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G03F 1/82
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68Preparation processes not covered by groups G03F1/20 - G03F1/50
82Auxiliary processes, e.g. cleaning or inspecting
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • NIKIPELOV, Andrey
  • KURILOVICH, Dmitry
  • SBRIZZAI, Fabio
  • VAN DE KERKHOF, Marcus, Adrianus
  • VAN DER WOORD, Ties, Wouter
  • VAN DER ZANDE, Willem, Joan
  • VAN DUIVENBODE, Jeroen
  • VLES, David, Ferdinand
Agents
  • FILIP, Diana
Priority Data
18208555.527.11.2018EP
19173742.810.05.2019EP
19180219.814.06.2019EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MEMBRANE CLEANING APPARATUS
(FR) APPAREIL DE NETTOYAGE DE MEMBRANE
Abstract
(EN)
A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may comprise: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
(FR)
La présente invention concerne un appareil de nettoyage de membrane servant à éliminer des particules d'une membrane et comprenant : un support de membrane ; et un mécanisme générateur de champ électrique. Le support de membrane sert à supporter la membrane. Le mécanisme générateur de champ électrique sert à générer un champ électrique à proximité de la membrane lorsqu'il est supporté par le support de membrane. Le mécanisme générateur de champ électrique peut comprendre : une ou plusieurs électrodes de collecteur ; et un mécanisme servant à appliquer une tension à travers une membrane supportée par le support de membrane et à travers la ou les électrodes de collecteur.
Latest bibliographic data on file with the International Bureau