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1. WO2020108984 - SYSTEMS AND METHODS OF COOLING OBJECTIVE LENS OF A CHARGED-PARTICLE BEAM SYSTEM

Publication Number WO/2020/108984
Publication Date 04.06.2020
International Application No. PCT/EP2019/081070
International Filing Date 12.11.2019
IPC
H01J 37/141 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10Lenses
14magnetic
141Electromagnetic lenses
B33Y 80/00 2015.01
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
80Products made by additive manufacturing
CPC
B33Y 80/00
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
80Products made by additive manufacturing
H01J 2237/002
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
002Cooling arrangements
H01J 2237/1405
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
10Lenses
14magnetic
1405Constructional details
H01J 2237/2817
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
28Scanning microscopes
2813characterised by the application
2817Pattern inspection
H01J 37/141
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
10Lenses
14magnetic
141Electromagnetic lenses
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • GOSEN, Jeroen, Gerard
  • HOL, Sven, Antoin, Johan
  • VAN HEUMEN, Martijn, Petrus, Christianus
  • VAN BANNING, Dennis, Herman, Caspar
  • HOSSEINI, Naseh
Agents
  • PETERS, John Antoine
Priority Data
62/773,97230.11.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SYSTEMS AND METHODS OF COOLING OBJECTIVE LENS OF A CHARGED-PARTICLE BEAM SYSTEM
(FR) SYSTÈMES ET PROCÉDÉS DE REFROIDISSEMENT DE LENTILLE D'OBJECTIF D'UN SYSTÈME À FAISCEAU DE PARTICULES CHARGÉES
Abstract
(EN)
Systems and methods for cooling an objective lens of a charged- particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged- particle beam system comprises receiving a fluid via a fluid input port (432) of a bobbin (320), circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels (335,635) distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port (532) of the bobbin. The bobbin may further comprise a bottom flange (520) proximal to a wafer and a top flange (510) distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.
(FR)
La présente invention concerne des systèmes et des procédés de refroidissement d'une lentille d'objectif d'un système à faisceau de particules chargées. Selon certains modes de réalisation, le procédé de refroidissement d'une lentille d'objectif d'un système à faisceau de particules chargées consiste à recevoir un fluide par un orifice d'entrée de fluide d'une bobine, à faire circuler le fluide qui absorbe la chaleur produite par une pluralité de bobines électromagnétiques de la lentille d'objectif, par l'intermédiaire d'une pluralité de canaux répartis dans la bobine, et à distribuer le fluide mis en circulation par la pluralité de canaux par un orifice de sortie de fluide de la bobine. La bobine peut en outre comprendre une bride inférieure proximale à une tranche et une bride supérieure distale par rapport à la tranche. La bobine comportant la pluralité de canaux peut comprendre une structure monolithique fabriquée de manière additive.
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