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1. WO2020108892 - MODULE FOR A PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH A SEMI-ACTIVE SPACER, AND METHOD FOR USING THE SEMI-ACTIVE SPACER

Publication Number WO/2020/108892
Publication Date 04.06.2020
International Application No. PCT/EP2019/079182
International Filing Date 25.10.2019
IPC
G02B 7/02 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
G02B 27/00 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/-G02B26/119
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 27/0068
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
27Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
0025for optical correction, e.g. distorsion, aberration
0068having means for controlling the degree of correction, e.g. using phase modulators, movable elements
G02B 7/023
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
023permitting adjustment
G03F 7/70258
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70258Projection system adjustment, alignment during assembly of projection system
G03F 7/70266
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70258Projection system adjustment, alignment during assembly of projection system
70266Adaptive optics, e.g. deformable optical elements for wavefront control
G03F 7/70591
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70591Testing optical components
G03F 7/706
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70591Testing optical components
706Aberration measurement
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • POLLAK, Thilo
  • DUERR, Dietmar
Agents
  • RAUNECKER, Klaus, Peter
Priority Data
10 2018 220 565.529.11.2018DE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MODULE FOR A PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH A SEMI-ACTIVE SPACER, AND METHOD FOR USING THE SEMI-ACTIVE SPACER
(FR) MODULE POUR UN APPAREIL D'EXPOSITION PAR PROJECTION POUR LA LITHOGRAPHIE À SEMI-CONDUCTEUR AVEC UN ESPACEUR SEMI-ACTIF, ET PROCÉDÉ D'UTILISATION DE L'ESPACEUR SEMI-ACTIF
Abstract
(EN)
The invention relates to a module (62, 72) for a projection exposure apparatus (1, 31) for semiconductor lithography, comprising at least one optical element (18, 19, 20, 38) arranged in a holder (50, 50'), wherein at least one spacer (52) is arranged between the holder (50) and a further holder (50') or a main body (54), wherein the spacer (52) is designed to semi-actively vary its extent. The invention also relates to a method for positioning at least one holder (50, 50') in a projection exposure apparatus (1, 31) for semiconductor lithography, wherein a semi-active spacer (52) is used for positioning the holder (50, 50').
(FR)
L'invention concerne un module (62, 72) pour un appareil d'exposition par projection (1, 31) pour la lithographie à semi-conducteur, comprenant au moins un élément optique (18, 19, 20, 38) disposé dans un support (50, 50'), au moins un espaceur (52) étant disposé entre le support (50) et un autre support (50') ou un corps principal (54), l'espaceur (52) étant conçu pour faire varier de manière semi-active son étendue. L'invention concerne également un procédé de positionnement d'au moins un support (50, 50') dans un appareil d'exposition par projection (1, 31) pour la lithographie à semi-conducteur, un espaceur semi-actif (52) étant utilisé pour positionner le support (50, 50').
Also published as
Latest bibliographic data on file with the International Bureau