Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020108421 - HEXAARYLBIIMIDAZOLE HYBRID PHOTOINITIATOR AND APPLICATION

Publication Number WO/2020/108421
Publication Date 04.06.2020
International Application No. PCT/CN2019/120524
International Filing Date 25.11.2019
IPC
G03F 7/031 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028with photosensitivity-increasing substances, e.g. photoinitiators
031Organic compounds not covered by group G03F7/02967
C07D 233/00 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
233Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
CPC
C07D 233/00
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
DHETEROCYCLIC COMPOUNDS
233Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
G03F 7/004
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/027
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G03F 7/031
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
028with photosensitivity-increasing substances, e.g. photoinitiators
031Organic compounds not covered by group G03F7/029
Applicants
  • 常州格林感光新材料有限公司 (CHAN-N) CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. [CN]/[CN]
Inventors
  • 钱彬 QIAN, Bin
Agents
  • 北京汉德知识产权代理事务所(普通合伙) HANDE INTELLECTUAL PROPERTY FIRM
Priority Data
201811451262.430.11.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) HEXAARYLBIIMIDAZOLE HYBRID PHOTOINITIATOR AND APPLICATION
(FR) PHOTO-INITIATEUR HYBRIDE À BASE D'HEXAARYLBIIMIDAZOLE ET APPLICATION
(ZH) 六芳基双咪唑类混合光引发剂及应用
Abstract
(EN)
A hexaarylbiimidazole hybrid photoinitiator, having a structure as represented by formula (I), and containing a biimidazole compound having four attachment sites, i.e., 1'-2, 2-3', 1-2' and 2'-3. The total mass percentage content of the biimidazole compound having the four attachment positions in the hybrid photoinitiator is above 92%. Ar 1, Ar 2, Ar 3, Ar 4, Ar 5, and Ar 6 in the formula (I) each independently represents a substituted or unsubstituted aryl group. A photosensitive resin composition containing the hexaarylbiimidazole hybrid photoinitiator has good compatibility, excellent photosensitivity, and a small amount of developing waste, and can be widely used in the forms of a dry film and a wet film.
(FR)
Cette invention concerne un photo-initiateur hybride à base d'hexaarylbiimidazole, ayant une structure telle que représentée par la formule (I), et contenant un composé biimidazole ayant quatre sites de liaison, c'est-à-dire, 1'-2, 2-3 ', 1-2'et 2'-3. La teneur en pourcentage en masse totale du composé biimidazole ayant les quatre positions de liaison dans le photo-initiateur hybride est supérieure à 92 %. Dans la formule (I), Ar1, Ar2, Ar3, Ar4, Ar5 et Ar6 représentent chacun indépendamment un groupe aryle substitué ou non substitué. Une composition de résine photosensible contenant le photo-initiateur hybride à base d'hexaarylbiimidazole présente une bonne compatibilité, une excellente photosensibilité et une petite quantité de déchets de développement, et peut être largement utilisée dans les formes d'un film sec et d'un film humide.
(ZH)
一种六芳基双咪唑类混合光引发剂,具有如通式(I)所示结构,其中含有1'-2、2-3'、1-2'和2'-3四种连接位的双咪唑化合物,且该四种连接位的双咪唑化合物在混合光引发剂中的总质量百分含量为92%以上,通式(I)中Ar 1、Ar 2、Ar 3、Ar 4、Ar 5、Ar 6各自独立地表示取代或未取代的芳基。包含该六芳基双咪唑类混合光引发剂的感光性树脂组合物相容性好、感光度优异、显影垃圾量较少,能够以干膜和湿膜的方式得到广泛应用。
Also published as
Latest bibliographic data on file with the International Bureau