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1. WO2020107126 - ELECTROCHROMATIC OPTICAL DEVICES, SYSTEMS, AND METHODS

Note: Text based on automatic Optical Character Recognition processes. Please use the PDF version for legal matters

[ EN ]

CLAIMS:

1 . An adjustable optic device, comprising:

a) at least one counter electrode;

b) one or more working electrodes, each working electrode having an arrangement of nanostructured electrodeposition sites;

c) an insulating framework separating the counter electrode from each working electrode; and

d) an electrolyte medium between the counter electrode and the one or more working electrodes for conducting ions therebetween;

e) wherein each working electrode is reversibly transitionable from a stripped state toward a plated state when a plating charge voltage is applied across the working electrode and the counter electrode to induce nanoplating at the nanostructured electrodeposition sites with ions from the electrolyte medium, and when in the stripped state, the one or more working electrodes are generally transparent and present a passage through the optic device for transmission of electromagnetic radiation, and when the one or more working electrodes are in the plated state, the electrodeposition sites are nanoplated with ions from the electrolyte medium to adjust one or more optical properties for at least a portion of the passage relative to the stripped state.

2. The optic device of claim 1 , wherein the electrodeposition sites are formed of a noble metal.

3. The optic device of claim 2, wherein the electrodeposition sites comprise nanowires of the noble metal.

4. The optic device of claim 2, wherein each working electrode comprises a conductive substrate, and the electrodeposition sites comprise at least one of a noble metal nano-coating on the substrate and a noble metal nano-seeding on the substrate.

5. The optic device of claim 4, wherein the conductive substrate has an inert coating for inhibiting undesirable chemical reaction between the electrolyte medium and the substrate.

6. The optic device of any one of claims 4 to 5, wherein the substrate comprises conductive nanowires.

7. The optic device of claim 6, wherein the nanowires comprise silver nanowires.

8. The optic device of any one of claims 4 to 5, wherein the substrate comprises at least one of graphene and carbon nanotubes.

9. The optic device of any one of claims 4 to 5, wherein the substrate comprises a metal film having a thickness of less than 100nm.

10. The optic device of any one of claims 4 to 5, wherein the substrate comprises a conductive oxide film.

1 1. The optic device of any one of claims 2 to 10, wherein the noble metal comprises at least one of rhodium, palladium, osmium, iridium, platinum, and gold.

12. The optic device of claim 11 , wherein the noble metal comprises platinum.

13. The optic device of any one of claims 2 to 12, wherein the ions and the counter electrode comprises a non-ferromagnetic metal other than the noble metal.

14. The optic device of claim 13, wherein the ions and the counter electrode comprise one of: gold, copper, and silver.

15. The optic device of any one of claims 1 to 14, wherein the electrolyte medium includes at least one of spacing agents and leveling agents to facilitate uniform nanoplating of the electrodeposition sites with the ions.

16. The optic device of any one of claims 1 to 15, wherein when the one or more working electrodes are in the plated state, transmissivity is reduced primarily through an increase in reflectance.

17. The optic device of any one of claims 1 to 16, wherein each working electrode is transitionable from the plated state toward the stripped state in response to application of a stripping charge voltage across the working electrode and the counter electrode to induce stripping of nanoplated ions from the electrodeposition sites, the stripping charge voltage having a different charge voltage from that of the plating charge voltage.

18. The optic device of claim 17, wherein the one or more working electrodes are unstable in the stripped state and transition toward the plated state absent application of the stripping charge voltage.

19. The optic device of any one of claims 1 to 17, wherein the one or more working electrodes are unstable in the plated state and transition toward the stripped state absent application of the plating charge voltage.

20. The optic device of any one of claims 1 to 17, wherein the one or more working electrodes are stable in the stripped state, the plated state, and any intermediate state between the stripped and plated states, and require voltage application to transition between states.

21. The optic device of any one of claims 1 to 20, wherein the portion of the passage has an opacity level when the one or more working electrodes are in the stripped state, and the electrodeposition sites are arranged to provide an opacifying nanoplating pattern for increasing the opacity level when the one or more working electrodes are in the plated state.

22. The optic device of claim 21 , wherein the opacity level is adjustable as a function of at least one of a value and application time of the plating charge voltage.

23. The optic device of any one of claims 21 to 22, wherein the opacity level is adjustable as a function of a pattern of the plating charge voltage.

24. The optic device of any one of claims 1 to 20, wherein the passage has an aperture size for transmission of electromagnetic radiation therethrough when the one or more working electrodes are in the stripped state, and the electrodeposition sites are arranged to provide an aperture reduction nanoplating pattern for reducing the aperture size when the one or more working electrodes are in the plated state.

25. The optic device of claim 24, wherein the aperture size is adjustable as a function of a value and application time of the plating charge voltage.

26. The optic device of any one of claims 24 to 25, wherein the aperture size is adjustable as a function of a pattern of the plating charge voltage.

27. The optic device of any one of claims 24 to 26, wherein at least one of the working electrodes has a conductor pattern providing progressively increasing

resistivity from a radially outer region to a radially inner region such that radially outer electrodeposition sites are plated prior to radially inner electrodeposition sites to progressively reduce the aperture size during application of the plating charge voltage.

28. The optic device of claim 27, wherein the conductor pattern comprises one of a spiral pattern, a pattern of concentric rings, and a sectored arrangement of radially inwardly tapering zig-zag patterns.

29. The optic device of any one of claims 1 to 20, wherein the electrodeposition sites are arranged to provide a coded aperture nanoplating pattern for providing a coded aperture in the passage when the one or more working electrodes are in the plated state, the coded aperture comprising a pattern of subapertures for providing light field information.

30. The optic device of claim 29, wherein each subaperture has a respective subaperture size, the subaperture size adjustable as a function of a value and application time of the plating charge voltage.

31. The optic device of claim 29, wherein each subaperture has a respective subaperture size, the subaperture size adjustable as a function of a pattern of the plating charge voltage.

32. The optic device of any one of claims 30 to 31 , wherein at least one of the working electrodes has a conductor pattern providing progressively increasing resistivity toward each subaperture such that electrodeposition sites further from the subaperture are nanoplated prior to electrodeposition sites adjacent the subaperture to progressively reduce the subaperture size during application of the plating charge voltage.

33. The optic device of any one of claims 1 to 20, wherein the electrodeposition sites are arranged to provide a filtering nanoplating pattern for filtering a target wavelength of the electromagnetic radiation when the one or more working electrodes are in the plated state.

34. The optic device of claim 33, wherein the filtering nanoplating pattern comprises a plurality of gates having a gate spacing suitable for filtering the target wavelength.

35. The optic device of claim 34, wherein the gate spacing and the target wavelength are adjustable as a function of a value and application time of the plating charge voltage.

36. The optic device of any one of claims 34 to 35, wherein the gate spacing and the target wavelength are adjustable as a function of a pattern of the plating charge voltage.

37. The optic device of any one of claims 1 to 20, wherein the electrodeposition sites are arranged to provide a polarizing nanoplating pattern for polarizing the electromagnetic radiation when the one or more working electrodes are in the plated state.

38. The optic device of claim 37, wherein the electrolyte medium includes ionic nanoparticles structured for predefined directional assembly during nanoplating at the electrodeposition sites to facilitate polarization of the electromagnetic radiation.

39. The optic device of claim 38, wherein the nanoparticles have a magnetic polarity property allowing for modification of the directional assembly via a magnetic field having a predetermined directionality and magnitude.

40. The optic device of any one of claims 1 to 39, wherein the optic device includes a single working electrode in communication with the counter electrode via the electrolyte medium.

41. The optic device of any one of claims 1 to 20, wherein the device includes a plurality of the working electrodes including at least one first working electrode and at least one second working electrode, each of the working electrodes independently connected to the counter electrode for application of a respective plating charge voltage thereacross and selectively transitionable between the stripped state and the plated state independently of one another.

42. The optic device of claim 41 , wherein the electrodeposition sites of each working electrode are arranged in a respective nanoplating pattern, the nanoplating patterns of at least the first and second working electrodes being different from and complementary to one another.

43. The optic device of any one of claims 41 to 42, wherein the electrodeposition sites are arranged to increase an opacity of the passage to a first opacity level when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and to increase the opacity of the passage to a second opacity level when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the second opacity level greater than the first opacity level.

44. The optic device of claim 43, wherein the electrodeposition sites are arranged to increase the opacity of the passage to the second level when the at least one second working electrode is in the plated state and the at least one first working electrode is in the stripped state, and to increase the opacity of the passage to a third level when both the at least one first working electrode and the at least one second working electrode are in the plated state, the third opacity level greater than the second opacity level.

45. The optic device of any one of claims 41 to 42, wherein the electrodeposition sites are arranged to provide the passage with a first aperture size when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and a second aperture size when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the second aperture size smaller than the first aperture size.

46. The optic device of claim 45, wherein the electrodeposition sites are arranged to provide the passage with the second aperture size when the at least one second working electrode is in the plated state and the at least one first working electrode is in the stripped state.

47. The optic device of any one of claims 41 to 42, wherein the electrodeposition sites are arranged to provide a first coded aperture in the passage when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and to provide a second coded aperture in the passage when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the first coded aperture having a first subaperture pattern and the second coded aperture having a second subaperture pattern different from the first subaperture pattern.

48. The optic device of claim 47, wherein the electrodeposition sites are arranged to provide the second coded aperture when the at least one second working electrode is in the plated state and the at least one first working electrode is in the stripped state, and to provide a third coded aperture in the passage when both the at least one first working electrode and the at least one second working electrode are in the plated state, the third coded aperture having a third subaperture pattern different from the first and second subaperture patterns.

49. The optic device of claim 48, wherein the first coded aperture includes a pattern of first blocking portions and the second coded aperture includes a pattern of second blocking portions, and wherein the third coded aperture comprises a pattern of third blocking portions defined by a combination of the first and second blocking portions.

50. The optic device of claim 49, wherein each first blocking portion has a respective first opacity level, each second blocking portion has a respective second opacity level, and at least one of the third blocking portions is formed by overlapping first and second blocking portions to provide the at least one of the third blocking portions with a third opacity level greater than the first and second opacity levels of the overlapping first and second blocking portions.

51. The optic device of any one of claims 41 to 42, wherein the electrodeposition sites are arranged to filter a first wavelength of electromagnetic radiation when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and to filter a second wavelength of electromagnetic radiation when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the second wavelength different from the first wavelength.

52. The optic device of any one of claims 41 to 42, wherein the electrodeposition sites are arranged to provide a first type of polarization to the electromagnetic radiation when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and to provide a second type of polarization to the electromagnetic radiation when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the second type of polarization different from the first type of polarization.

53. The optic device of any one of claims 41 to 52, wherein the passage extends along an axis and the at least one first working electrode and the at least one second working electrode are spaced axially apart from one another along the axis.

54. The optic device of claim 53, wherein the counter electrode is axially intermediate the first and second working electrodes.

55. The optic device of any one of claims 53 to 54, wherein the plurality of working electrodes includes at least one third working electrode, each third working electrode axially intermediate the counter electrode and a respective one of the first and second working electrodes.

56. The optic device of claim 55, wherein each third working electrode is formed on a porous substrate for permitting passage of ions therethrough to facilitate electrodeposition on the respective one of the first and second working electrodes.

57. The optic device of any one of claims 53 to 56, wherein the counter electrode at least partially circumscribes the electrolyte medium.

58. The optic device of any one of claims 1 to 57, further comprising an enclosure defined at least in part by the framework, the enclosure having a first end wall, a second end wall axially opposite the first end wall, a sidewall extending axially between the first and second endwalls, and an internal reservoir bounded axially by the first and second end walls and radially by the sidewall, and wherein the electrolyte medium is disposed in the reservoir.

59. The optic device of claim 58, wherein the first end wall comprises at least one of the working electrodes.

60. The optic device of any one of claims 58 to 59, wherein the second end wall comprises at least one of the working electrodes.

61. The optic device of any one of claims 58 to 60, wherein the sidewall has an inner surface directed radially inwardly toward the reservoir, the inner surface having a groove, and wherein the counter electrode is received in the groove and extends at least partially about the reservoir.

62. The optic device of any one of claims 41 to 48, wherein the at least one first working electrode and the at least one second working electrode are formed on a common substrate.

63. The optic device of claim 62, wherein the at least one first working electrode and the at least one second working electrode are in a sectored arrangement in which each extends circumferentially over a respective sector of the substrate.

64. The optic device of claim 62, wherein the at least one first working electrode and the at least one second working electrode are interlaced with one another.

65. The optic device of any one of claims 1 to 64, further comprising at least one meta-lens having an array of meta-lens wave guide structures projecting from a substrate, the array overlying at least a portion of the passage for guiding electromagnetic radiation passing therethrough.

66. The optic device of claim 65, wherein the electrodeposition sites overlie at least a portion of the array for occlusion thereof when plated.

67. The optic device of any one of claims 65 to 66, wherein the meta-lens comprises at least one of the one or more working electrodes.

68. The optic device of claim 67, wherein a plurality of the meta-lens wave guide structures comprise the electrodeposition sites.

69. The optic device of claim 68, wherein the electrodeposition sites are arranged to increase at least one dimension of the meta-lens wave guide structures when plated.

70. The optic device of claim 69, wherein each meta-lens wave guide structure projects form the substrate along an axis, and wherein the at least one dimension comprises at least one of a height measured along the axis between the substrate and a tip of the meta-lens wave guide structure, and a cross-sectional area normal to the axis.

71. The optic device of any one of claims 67 to 70, wherein adjacent meta-lens wave guide structures are spaced apart by a wave guide gap through which electromagnetic radiation is guided, and wherein the electrodeposition sites are

arranged on the substrate over at least some of the wave-guide gaps for blocking transmission of electromagnetic radiation therethrough when plated.

72. The optic device of claim 71 , wherein the electrodeposition sites are in the at least some of the wave-guide gaps on a side of the substrate from which the wave guide structures project.

73. An optic system comprising:

a) one or more of the optic devices of any one of claims 1 to 64; and

b) a controller operatively coupled to at least one of the optic devices, the controller operable to:

determine a state change to be applied to the working electrodes; and

initiate a transition at the working electrodes between respective stripped and plated states based on the determined state change.

74. The optic system of claim 73, wherein the controller operates to determine the state change to be applied to the working electrodes based on a user input.

75. The optic system of claim 74, further comprising an input device for receiving the user input, and transmitting the user input to the controller.

76. The optic system of any one of claims 73 to 75, wherein the controller is operable to determine the state change based on a sensor signal representing one or more properties relating to a scene viewable through the one or more optic devices.

77. The optic system of claim 76, further comprising a sensor for detecting the one or more properties relating to the scene and transmitting the sensor signal representing the one or more properties relating to the scene to the controller.

78. The optic system of any one of 76 to 77, wherein the controller is configured to:

i) determine, from the sensor signal, whether the one or more properties satisfy an adjustment condition; and

ii) in response to determining that the one or more properties satisfy the adjustment condition, initiate transition of at least one of the working electrodes to resolve the adjustment condition.

79. The optic system of any one of claims 76 to 78, wherein the controller operates to determine the state change in response to receiving a state change indicator.

80. The optic system of any one of claims 73 to 79, further comprising an eyewear frame, and wherein at least one of the optic devices is coupled to the eyewear frame to form at least part of a lens.

81. The optic system of any one of claims 73 to 80, wherein the one or more optic devices includes a plurality of the optic devices arranged side-by-side to form a screen.

82. The optic system of any one of claims 73 to 81 , wherein the one or more optic devices includes a plurality of the optic devices stacked one in front of another to form an optic stack.

83. A method of adjusting transmissivity in an optic device, the method comprising operating a controller operatively coupled to the optic device to:

determine a state change to be applied to one or more working electrodes of the optic device, each working electrode having an arrangement of nanostructured electrodeposition sites and each working electrode reversibly transitionable from a stripped state toward a plated state when a plating charge voltage is applied across the working electrode and a counter electrode to induce nanoplating at the nanostructured electrodeposition sites with ions from an electrolyte medium, and when in the stripped state, the one or more working electrodes are generally transparent and present a passage through the optic device for transmission of electromagnetic radiation, and when the one or more working electrodes are in the plated state, the electrodeposition sites are nanoplated with ions from the electrolyte medium to reduce transmissivity through the passage relative to the stripped state; and

initiate a transition at the one or more working electrodes between respective stripped and plated states based on the determined state change.

84. The method of claim 83, wherein operating the controller to initiate the transition comprises controlling application of the plating charge voltage across at least one working electrode and the counter electrode.

85. The method of claim 84, further comprising operating the controller to adjust the plating charge voltage.

86. The method of claim 85, further comprising operating the controller to adjust an application time of the plating charge voltage.

87. The method of any one of claims 85 to 86, further comprising operating the controller to adjust a pattern of the plating charge voltage.

88. The method of any one of claims 83 to 87, further comprising operating the controller to determine the state change based on a user input.

89. The method of claim 88, further comprising:

receiving the user input from an input device; and

transmitting an input signal corresponding to the user input to the controller.

90. The method of any one of claims 88 and 89, wherein the user input comprises a gesture performed by a user.

91. The method of any one of claims 83 to 90, further comprising operating the controller to determine the state change based on a sensor signal representing one or more properties relating to a scene viewable through the optic device.

92. The method of claim 91 , further comprising operating a sensor to detect the one or more properties, and to transmit the sensor signal representing the one or more properties to the controller.

93. The method of claim 92, further comprising operating the controller to:

determine, from the sensor signal, whether the one or more properties satisfy an adjustment condition; and

in response to determining that the one or more properties satisfy the adjustment condition, initiate the transition at the one or more working electrodes to resolve the adjustment condition.

94. The method of claim 93, wherein the one or more properties comprise an intensity level of electromagnetic radiation and the method comprises operating the controller to:

determine whether the intensity level exceeds a first intensity threshold; and

in response to determining that the intensity level exceeds the first intensity threshold, initiate the transition of the at least one working electrode towards the plated state.

95. The method of claim 94, further comprising operating the controller to:

determine whether the intensity level is below a second intensity threshold; and

in response to determining that the intensity level is below the second intensity threshold, initiate the transition of the at least one working electrode towards the stripped state.

96. The method of claim 93, wherein the one or more properties comprise light information for determining depth of field information relating to one or more objects in the scene.

97. An adjustable optic device for providing light field information, comprising: a) at least one counter electrode;

b) one or more working electrodes, each working electrode having an arrangement of electrodeposition sites;

c) an insulating framework separating the counter electrode from each working electrode; and

d) an electrolyte medium between the counter electrode and the one or more working electrodes for conducting ions therebetween;

e) wherein each working electrode is reversibly transitionable from a stripped state toward a plated state when a plating charge voltage is applied across the working electrode and the counter electrode to induce plating at the electrodeposition sites with ions from the electrolyte medium, and when in the stripped state, the one or more working electrodes are generally transparent and present a passage through the optic device for transmission of electromagnetic radiation, and when the one or more working electrodes are in the plated state, the electrodeposition sites are plated with ions from the electrolyte medium to provide a coded aperture in the passage, the coded aperture comprising a pattern of subapertures for providing light field information.

98. The optic device of claim 97, wherein each subaperture has a respective subaperture size, the subaperture size adjustable as a function of a value and application time of the plating charge voltage.

99. The optic device of claim 98, wherein each subaperture has a respective subaperture size, the subaperture size adjustable as a function of a pattern of the plating charge voltage.

100. The optic device of any one of claims 98 to 99, wherein at least one of the working electrodes has a conductor pattern providing progressively increasing resistivity toward each subaperture such that electrodeposition sites further from the subaperture are plated prior to electrodeposition sites adjacent the subaperture to progressively reduce the subaperture size during application of the plating charge voltage.

101. The optic device of any one of claims 97 to 100, wherein the device includes a plurality of the working electrodes including at least one first working electrode and at least one second working electrode, each of the working electrodes independently connected to the counter electrode for application of a respective plating charge voltage thereacross and selectively transitionable between the stripped state and the plated state independently of one another.

102. The optic device of claim 101 , wherein the electrodeposition sites are arranged to provide a first coded aperture in the passage when the at least one first working electrode is in the plated state and the at least one second working electrode is in the stripped state, and to provide a second coded aperture in the passage when the at least one second working electrode is in the plated state and the at least one first working electrode is in one of the stripped state and the plated state, the first coded aperture having a first subaperture pattern and the second coded aperture having a second subaperture pattern different from the first subaperture pattern.

103. The optic device of claim 102, wherein the electrodeposition sites are arranged to provide the second coded aperture when the at least one second working electrode is in the plated state and the at least one first working electrode is in the stripped state, and to provide a third coded aperture in the passage when both the at least one first working electrode and the at least one second working electrode are in the plated state, the third coded aperture having a third subaperture pattern different from the first and second subaperture patterns.

104. The optic device of claim 103, wherein the first coded aperture includes a pattern of first blocking portions and the second coded aperture includes a pattern of second blocking portions, and wherein the third coded aperture comprises a pattern of third blocking portions defined by a combination of the first and second blocking portions.

105. The optic device of claim 104, wherein each first blocking portion has a respective first opacity level, each second blocking portion has a respective second opacity level, and at least one of the third blocking portions is formed by overlapping first and second blocking portions to provide the at least one of the third blocking portions with a third opacity level greater than the first and second opacity levels of the overlapping first and second blocking portions.

106. An optic device comprising a coded aperture mask reversibly transitionable from a first state toward a second state in response to application of a charge voltage, and when in the first state, the coded aperture mask has a transmissivity of at least 70 percent, and when in the second state, the coded aperture mask has a transmissivity of less than 30 percent and defines a pattern of subapertures for providing light field information.

107. The optic device of claim 106, wherein when in the first state, the coded aperture mask has a transmissivity of at least 90 percent, and when in the second state, the coded aperture mask has a transmissivity of less than 10 percent.

108. The optic device of claim 107, wherein when in the second state, the coded aperture mask has a transmissivity of less than 1 percent.

109. The optic device of claim 106, wherein the coded aperture mask comprises electrodeposition sites arranged on one or more working electrodes.

1 10. An optic device comprising:

a) a multifocal lens having a plurality of discrete optical zones;

b) a coded aperture mask in alignment with at least one of the optical zones, the coded aperture mask transitionable from a first state toward a second state in response to application of a charge voltage, and when in the first state, the coded aperture mask is generally transparent, and when in the second state, the coded aperture mask is generally opaque and defines a pattern of subapertures extending over the at least one of the optical zones.

1 1 1. The optic device of claim 1 10, wherein the optical zones comprise at least one of a refractive zone, a diffractive zone, and a combination thereof.

1 12. A method of generating light field information, comprising:

a) receiving first image data representing a scene from electromagnetic radiation passing through an open aperture in a passage of the optic device;

b) after step (a), applying a first plating charge voltage across at least one first working electrode and a counter electrode of the optic device to induce a first nanoplating of the first working electrode with ions from an electrolyte medium, the first nanoplating arranged to provide a first coded aperture in the passage;

c) receiving second image data representing the scene from electromagnetic radiation passing through the first coded aperture; and

d) generating light field information relating to the scene based on at least the first image data and the second image data.

1 13. The method of claim 1 12, wherein the light field information comprises depth information relating to the scene.

1 14. The method of any one of claims 1 12 to 1 13, further comprising:

applying a second plating charge voltage across the first working electrode and the counter electrode to induce a second nanoplating of the first working electrode with ions from the electrolyte medium, the second nanoplating arranged to provide a second coded aperture in the passage, the second coded aperture having a subaperture size different from that of the first coded aperture;

receiving third image data representing the scene from electromagnetic radiation passing through the second coded aperture; and

wherein step (d) includes generating light field information relating to the scene based on at least the first, second, and third image data.

1 15. The method of any one of claims 1 12 to 1 13, further comprising:

applying a second plating charge voltage across at least one second working electrode and the counter electrode of the optic device to induce a second nanoplating of the second working electrode with ions from the electrolyte medium, the second nanoplating arranged to provide a second coded aperture in the passage, the second coded aperture having a subaperture pattern different from that of the first coded aperture;

receiving third image data representing the scene from electromagnetic radiation passing through the second coded aperture; and

wherein step (d) includes generating light field information relating to the scene based on at least the first, second, and third image data.

1 16. The method of claim 1 15, wherein the subaperture pattern of the second coded aperture is an inverse of that of the first coded aperture.

1 17. The method of claim 1 15, wherein the first coded aperture forms at least a portion of a first coded aperture set defining a first subaperture pattern and the second coded aperture forms at least a portion of a second coded aperture set defining a second subaperture pattern, and wherein the first subaperture pattern is an inverse of the second subaperture pattern.