Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020094517 - LITHOGRAPHY SUPPORT CLEANING WITH CLEANING SUBSTRATE HAVING CONTROLLED GEOMETRY AND COMPOSITION

Publication Number WO/2020/094517
Publication Date 14.05.2020
International Application No. PCT/EP2019/079934
International Filing Date 31.10.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70925
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
70925Cleaning, i.e. actively freeing apparatus from pollutants
Applicants
  • ASML HOLDING N.V. [NL]/[NL]
Inventors
  • LEVY, Keane, Michael
  • HARLALKA, Akshay, Dipakkumar
Agents
  • SLENDERS, Petrus Johannes Waltherus
Priority Data
62/757,83709.11.2018US
62/912,97109.10.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) LITHOGRAPHY SUPPORT CLEANING WITH CLEANING SUBSTRATE HAVING CONTROLLED GEOMETRY AND COMPOSITION
(FR) NETTOYAGE DE SUPPORT DE LITHOGRAPHIE AVEC UN SUBSTRAT DE NETTOYAGE AYANT UNE GÉOMÉTRIE ET UNE COMPOSITION CONTRÔLÉES
Abstract
(EN)
Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which a cleaning substrate provided with a coating made a selected material and configuration is pressed against the working surface so that the contaminant is transferred from the working surface to the coating.
(FR)
L'invention concerne un appareil et un procédé d'élimination d'un contaminant d'une surface de travail d'un support de lithographie tel qu'un réticule ou un étage de tranche dans un système de photolithographie EUV ou DUV dans lequel un substrat de nettoyage pourvu d'un revêtement constitué d'un matériau et d'une configuration sélectionnés est pressé contre la surface de travail de telle sorte que le contaminant est transféré de la surface de travail au revêtement.
Latest bibliographic data on file with the International Bureau