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1. WO2020094369 - APPARATUS FOR AND METHOD OF MEASURING DISTORTION OF A PATTERNING DEVICE IN A PHOTOLITHOGRAPHIC APPARATUS

Publication Number WO/2020/094369
Publication Date 14.05.2020
International Application No. PCT/EP2019/078503
International Filing Date 21.10.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70783
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70783Stress or warp of chucks, mask or workpiece, e.g. to compensate for imaging error
G03F 7/7085
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applicants
  • ASML HOLDING N.V. [NL]/[NL]
Inventors
  • KALLURI, Ravi, Chaitanya
Agents
  • SLENDERS, Petrus Johannes Waltherus
Priority Data
62/755,59005.11.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) APPARATUS FOR AND METHOD OF MEASURING DISTORTION OF A PATTERNING DEVICE IN A PHOTOLITHOGRAPHIC APPARATUS
(FR) APPAREIL ET PROCÉDÉ DE MESURE DE DISTORSION D'UN DISPOSITIF DE FORMATION DE MOTIFS DANS UN APPAREIL PHOTOLITHOGRAPHIQUE
Abstract
(EN)
A system for and method of measuring reticle distortion using a pneumatic sensor in which nozzles are placed along the sides of a reticle and the pneumatic sensor generates an output signal indicative of a distance between the sensor and a portion of the side of the reticle. The reticle distortion measurement from the sensor may be used as an input to a reticle heating control.
(FR)
La présente invention concerne un système et un procédé de mesure de distorsion de réticule utilisant un capteur pneumatique dans lequel des buses sont placées le long des côtés d'un réticule et dans lequel le capteur pneumatique génère un signal de sortie indicatif d'une distance entre le capteur et une partie du côté du réticule. La mesure de distorsion de réticule provenant du capteur peut être utilisée en tant qu'entrée pour une commande de chauffage de réticule.
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