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1. WO2020090580 - FRAME MEMBER FOR ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE

Publication Number WO/2020/090580
Publication Date 07.05.2020
International Application No. PCT/JP2019/041520
International Filing Date 23.10.2019
IPC
H01J 37/20 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
H01J 37/305 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
305for casting, melting, evaporating, or etching
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants
  • 京セラ株式会社 KYOCERA CORPORATION [JP]/[JP]
Inventors
  • 古川 茂伸 FURUKAWA, Shigenobu
  • 明石 幸治 AKASHI, Koji
Agents
  • 特許業務法人ブナ国際特許事務所 BUNA PATENT ATTORNEYS
Priority Data
2018-20293829.10.2018JP
2019-09194015.05.2019JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) FRAME MEMBER FOR ELECTRON BEAM LITHOGRAPHY DEVICE AND ELECTRON BEAM LITHOGRAPHY DEVICE
(FR) ÉLÉMENT DE CADRE POUR DISPOSITIF DE LITHOGRAPHIE PAR FAISCEAU D'ÉLECTRONS ET DISPOSITIF DE LITHOGRAPHIE PAR FAISCEAU D'ÉLECTRONS
(JA) 電子線描画装置用枠部材および電子線描画装置
Abstract
(EN)
This frame member for an electron beam lithography device includes a frame body comprising sapphire or aluminum oxide-based ceramic having an open porosity of 0.2% or less, and a conductive film disposed at least on a main surface of the frame body facing an electron gun.
(FR)
La présente invention concerne un élément de cadre pour un dispositif de lithographie par faisceau d'électrons comprenant un corps de cadre comprenant un saphir ou une céramique à base d'oxyde d'aluminium ayant une porosité ouverte de 0,2 % ou moins, et un film conducteur disposé au moins sur une surface principale du corps de cadre faisant face à un canon à électrons.
(JA)
本開示の電子線描画装置用枠部材は、サファイアまたは開気孔率が0.2%以下の酸化アルミニウム質セラミックスからなる枠本体と、枠本体の少なくとも電子銃側の主面に配された導電膜とを備える。
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