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1. WO2020072762 - REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER

Publication Number WO/2020/072762
Publication Date 09.04.2020
International Application No. PCT/US2019/054477
International Filing Date 03.10.2019
IPC
C21C 5/44 2006.01
CCHEMISTRY; METALLURGY
21METALLURGY OF IRON
CPROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
5Manufacture of carbon steel, e.g. plain mild steel, medium carbon steel, or cast-steel
28Manufacture of steel in the converter
42Constructional features of converters
44Refractory linings
C21C 5/46 2006.01
CCHEMISTRY; METALLURGY
21METALLURGY OF IRON
CPROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
5Manufacture of carbon steel, e.g. plain mild steel, medium carbon steel, or cast-steel
28Manufacture of steel in the converter
42Constructional features of converters
46Details or accessories
CPC
H01J 37/32862
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32431Constructional details of the reactor
32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
32853Hygiene
32862In situ cleaning of vessels and/or internal parts
Applicants
  • LAM RESEARCH CORPORATION [US]/[US]
Inventors
  • YU, Jengyi
  • TAN, Samantha SiamHwa
  • HEO, Seongjun
  • YUAN, Ge
  • KANAKASABAPATHY, Siva Krishnan
Agents
  • WIGGINS, Michael D.
Priority Data
62/741,75405.10.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) REMOVING METAL CONTAMINATION FROM SURFACES OF A PROCESSING CHAMBER
(FR) ÉLIMINATION DE CONTAMINATION PAR LES MÉTAUX DES SURFACES D'UNE CHAMBRE DE TRAITEMENT
Abstract
(EN)
A method for cleaning surfaces of a substrate processing chamber includes a) supplying a first gas selected from a group consisting of silicon tetrachloride (SiCU4), carbon tetrachloride (CCI4), a hydrocarbon (CxHy where x and y are integers) and molecular chlorine (CI2), boron trichloride (BCI3), and thienyl chloride (SOCI2); b) striking plasma in the substrate processing chamber to etch the surfaces of the substrate processing chamber; c) extinguishing the plasma and evacuating the substrate processing chamber; d) supplying a second gas including fluorine species; e) striking plasma in the substrate processing chamber to etch the surfaces of the substrate processing chamber; and f) extinguishing the plasma and evacuating the substrate processing chamber.
(FR)
L’invention concerne un procédé de nettoyage de surfaces d'une chambre de traitement de substrat qui comprend : a) l'alimentation en un premier gaz choisi dans un groupe constitué du tétrachlorure de silicium (SiCU4), du tétrachlorure de carbone (CCI4), d’un hydrocarbure (CxHy où x et y sont des nombres entiers) et du chlore moléculaire (CI2), du trichlorure de bore (BCI3), et du chlorure de thiényle (SOCI2) ; b) l’envoi de plasma dans la chambre de traitement de substrat pour attaquer les surfaces de la chambre de traitement de substrat ; c) l’extinction du plasma et l’évacuation de la chambre de traitement de substrat ; d) l’alimentation en un second gaz comprenant des espèces fluorées ; e) l’envoi de plasma dans la chambre de traitement de substrat pour attaquer les surfaces de la chambre de traitement de substrat ; f) l’extinction du plasma et l’évacuation de la chambre de traitement de substrat.
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