Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020069001 - APPARATUS FOR AND METHOD OF CONTROLLING INTRODUCTION OF EUV TARGET MATERIAL INTO AN EUV CHAMBER

Publication Number WO/2020/069001
Publication Date 02.04.2020
International Application No. PCT/US2019/052985
International Filing Date 25.09.2019
IPC
H05G 2/00 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
CPC
H05G 2/005
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
001X-ray radiation generated from plasma
003being produced from a liquid or gas
005containing a metal as principal radiation generating component
H05G 2/006
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
001X-ray radiation generated from plasma
003being produced from a liquid or gas
006details of the ejection system, e.g. constructional details of the nozzle
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • TREES, Dietmar, Uwe, Herbert
  • MUSHI, Simon, Romeo, Estomih
  • SAMS, Benjamin, Andrew
  • MEDINA OSEGUERA, Alfonso
  • DRIESSEN, Theodorus, Wilhelmus
Agents
  • MARCELLI, Mark
Priority Data
62/736,65126.09.2018US
62/901,34017.09.2019US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) APPARATUS FOR AND METHOD OF CONTROLLING INTRODUCTION OF EUV TARGET MATERIAL INTO AN EUV CHAMBER
(FR) APPAREIL ET PROCÉDÉ DE COMMANDE DE L'INTRODUCTION D'UN MATÉRIAU CIBLE EUV DANS UNE CHAMBRE EUV
Abstract
(EN)
Apparatus for and method of controlling introduction of EUV target material into an EUV chamber in which the EUV target material is selectively prevented from entering the EUV chamber when the EUV target material is not needed for the formation of a plasma in the EUV chamber such as during periods when a dispenser of the EUV material is initially started or is being tuned.
(FR)
La présente invention concerne un appareil et un procédé de commande de l'introduction d'un matériau cible EUV dans une chambre EUV dans laquelle le matériau cible EUV est sélectivement empêché d'entrer dans la chambre EUV lorsque le matériau cible EUV n'est pas nécessaire pour la formation d'un plasma dans la chambre EUV, par exemple pendant des périodes où un distributeur du matériau EUV est initialement démarré ou est accordé.
Latest bibliographic data on file with the International Bureau