Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020068142 - INTERFEROMETER WITH PIXELATED PHASE SHIFT MASK

Publication Number WO/2020/068142
Publication Date 02.04.2020
International Application No. PCT/US2018/062823
International Filing Date 28.11.2018
IPC
G01B 9/02 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers
G01B 11/24 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
24for measuring contours or curvatures
G02B 21/14 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
06Means for illuminating specimen
08Condensers
14affording illumination for phase-contrast observation
G01N 21/94 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws, defects or contamination
94Investigating contamination, e.g. dust
G01N 21/95 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws, defects or contamination
95characterised by the material or shape of the object to be examined
G01N 21/956 2006.01
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
84Systems specially adapted for particular applications
88Investigating the presence of flaws, defects or contamination
95characterised by the material or shape of the object to be examined
956Inspecting patterns on the surface of objects
CPC
G01B 11/2441
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
24for measuring contours or curvatures
2441using interferometry
G01B 11/303
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
30for measuring roughness or irregularity of surfaces
303using photoelectric detection means
G01B 2210/56
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
2210Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
56Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth
G01B 9/02011
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02001characterised by manipulating or generating specific radiation properties
02011using temporal polarization variation
G01B 9/02041
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02041characterised by particular imaging or detection techniques
G01B 9/02042
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02041characterised by particular imaging or detection techniques
02042Confocal imaging
Applicants
  • ONTO INNOVATION INC. [US]/[US]
Inventors
  • SMITH, Nigel P.
Agents
  • HALBERT, Michael J.
Priority Data
16/197,92921.11.2018US
62/738,78928.09.2018US
62/739,57401.10.2018US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) INTERFEROMETER WITH PIXELATED PHASE SHIFT MASK
(FR) INTERFÉROMÈTRE À MASQUE DE DÉPHASAGE PIXELISÉ
Abstract
(EN)
An interferometer uses a phase shift mask that includes an array of pixels that are aligned with a corresponding array of pixels of a detector. Each pixel in the phase shift mask is adapted to produce one of a number of predetermined phase shifts between a test beam and a reference beam. For example, the pixels may be linear polarizers or phase delay elements having one of the number of polarizer orientations or phase delays to produce the predetermined phase shifts between the test beam and the reference beam. The pixels in the phase shift mask are arranged in the array to include each of the predetermined phase shifts in repeating pixel groups in rows that are one column wide, columns that are one row high, or blocks of multiple rows and columns.
(FR)
L'invention concerne un interféromètre utilisant un masque de déphasage qui comprend un réseau de pixels alignés avec un réseau correspondant de pixels d'un détecteur. Chaque pixel dans le masque de déphasage est conçu pour produire un déphasage prédéterminé parmi un nombre de déphasages prédéterminés entre un faisceau test et un faisceau de référence. Par exemple, les pixels peuvent être des polariseurs linéaires ou des éléments de retard de phase disposant d'une des différentes orientations du polariseur ou des retards de phase pour produire les déphasages prédéterminés entre le faisceau test et le faisceau de référence. Les pixels dans le masque de déphasage sont agencés dans le réseau pour inclure chacun des déphasages prédéterminés dans des groupes de pixels répétés qui sont des rangées d'une largeur de colonne, des colonnes d'une hauteur d'une rangée ou des blocs de multiples rangées et colonnes.
Also published as
Latest bibliographic data on file with the International Bureau