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1. WO2020067668 - HOLOGRAM MEDIUM

Publication Number WO/2020/067668
Publication Date 02.04.2020
International Application No. PCT/KR2019/011874
International Filing Date 11.09.2019
IPC
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/075 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
075Silicon-containing compounds
G02B 5/32 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
32Holograms used as optical elements
CPC
G02B 5/32
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
32Holograms used as optical elements
G03F 7/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/004
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/075
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
075Silicon-containing compounds
Applicants
  • 주식회사 엘지화학 LG CHEM, LTD. [KR]/[KR]
Inventors
  • 장석훈 JANG, Seokhoon
  • 변진석 BYUN, Jinseok
  • 김헌 KIM, Heon
  • 권세현 KWON, Se Hyun
  • 장영래 CHANG, Yeongrae
Agents
  • 유미특허법인 YOU ME PATENT AND LAW FIRM
Priority Data
10-2018-011532227.09.2018KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) HOLOGRAM MEDIUM
(FR) SUPPORT D'HOLOGRAMME
(KO) 홀로그램 매체
Abstract
(EN)
The purpose of the present invention is to provide: a hologram recording medium having one surface with a higher surface energy than a polymer resin layer comprising one or more polymers selected from the group consisting of triacetyl cellulose, an alicyclic olefin polymer and a polyethylene terephthalate; a hologram recording medium of which the surface energy of any one surface is 50 mN/m or more; and an optical device comprising the hologram medium.
(FR)
Le but de la présente invention est de fournir : un support d'enregistrement d'hologramme ayant une surface avec une énergie de surface supérieure à celle d'une couche de résine polymère comprenant un ou plusieurs polymères choisis dans le groupe comprenant triacétylcellulose, un polymère d'oléfine alicyclique et un polyéthylène téréphtalate ; un support d'enregistrement d'hologramme dont l'énergie de surface d'une surface quelconque est de 50 mN/m ou plus ; et un dispositif optique comprenant le support d'hologramme.
(KO)
본 발명은, 트리아세틸셀룰로오스, 지환족 올레핀 고분자 및 폴리에틸렌 테레프탈레이트로 이루어진 군에서 선택된 1종 이상의 고분자를 포함하는 고분자 수지층에 비하여 보다 높은 표면 에너지를 갖는 일면을 갖는 홀로그램 기록 매체와 어느 일면의 표면 에너지가 50mN/m 이상인 홀로그램 기록 매체와 상기 홀로그램 매체를 포함하는 광학 소자를 제공하기 위한 것이다.
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