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1. WO2020067643 - CHEMICAL FUME REMOVAL DEVICE USING INTEGRATED LOCAL NOZZLE

Publication Number WO/2020/067643
Publication Date 02.04.2020
International Application No. PCT/KR2019/010147
International Filing Date 12.08.2019
IPC
H01L 21/67 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H01L 21/683 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683for supporting or gripping
CPC
H01L 21/67
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
H01L 21/683
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
683for supporting or gripping
Applicants
  • 무진전자 주식회사 MUJIN ELECTRONICS CO., LTD. [KR]/[KR]
Inventors
  • 윤병문 YOON, Byoung Moon
  • 이일상 LEE, Il Sang
Agents
  • 특허법인(유한) 다래 DARAE LAW & IP, LLC
Priority Data
10-2018-011573428.09.2018KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) CHEMICAL FUME REMOVAL DEVICE USING INTEGRATED LOCAL NOZZLE
(FR) DISPOSITIF D'ÉLIMINATION DE FUMÉES DE PRODUIT CHIMIQUE UTILISANT UNE BUSE LOCALE INTÉGRÉE
(KO) 일체형 국소 노즐을 이용한 케미컬 퓸 제거장치
Abstract
(EN)
The present invention relates to a chemical fume removal device using an integrated local nozzle. The present invention comprises: a treatment container disposed inside a chamber and having an opening formed on the upper end thereof; a chuck disposed inside the treatment container and having disposed thereon a substrate which is an object to be treated; an integrated local nozzle portion having, integrally formed therein, a chemical injection port for injecting a chemical on the substrate disposed on the chuck and fume discharge ports for sucking-in and discharging chemical fumes which are generated during a substrate treatment process using the chemical injected by the chemical injection port; and a fume guide cover coupled to the integrated local nozzle portion and guiding the chemical fumes generated during the substrate treatment process to the fume discharge ports. According to the present invention, by vacuum-suctioning and discharging, to the outside, the chemical fumes which are generated during an etching or cleaning process of a semiconductor procedure, using the integrated local nozzle, the chemical fumes can be prevented from diffusing to a chamber area outside the treatment container and contaminating the inside of the chamber and from being adhered to a constituent element positioned in a discharge path during the discharging process.
(FR)
La présente invention concerne un dispositif d'élimination de fumées de produit chimique utilisant une buse locale intégrée. La présente invention comprend : un récipient de traitement, disposé à l'intérieur d'une chambre et comportant une ouverture formée sur son extrémité supérieure ; un mandrin, disposé à l'intérieur du récipient de traitement et sur lequel est disposé un substrat qui est un objet à traiter ; une partie de buse locale intégrée comportant, formé d'un seul tenant dans cette dernière, un orifice d'injection de produit chimique, permettant d'injecter un produit chimique sur le substrat disposé sur le mandrin, et des orifices d'évacuation de fumées, permettant d'aspirer et d'évacuer des fumées de produit chimique qui sont générées pendant un processus de traitement de substrat à l'aide du produit chimique injecté par l'orifice d'injection de produit chimique ; et un couvercle de guidage de fumées, accouplé à la partie de buse locale intégrée et guidant les fumées de produit chimique générées pendant le processus de traitement de substrat vers les orifices d'évacuation de fumées. Selon la présente invention, par aspiration et par évacuation sous vide vers l'extérieur des fumées de produit chimique qui sont générées pendant un processus d'attaque ou de nettoyage d'une production de semi-conducteur, à l'aide de la buse locale intégrée, la diffusion de fumées de produit chimique vers une zone de chambre à l'extérieur du récipient de traitement et la contamination à l'intérieur de la chambre peuvent être empêchées, ainsi que le collage à un élément constitutif positionné dans une voie d'évacuation pendant le processus d'évacuation.
(KO)
본 발명은 일체형 국소 노즐을 이용한 케미컬 퓸 제거장치에 관한 것이다. 본 발명은 챔버 내부에 배치되어 있으며 상단에 개구부가 형성되어 있는 처리 용기, 상기 처리 용기 내부에 배치되어 있으며 처리 대상인 기판이 배치된 척, 상기 척에 배치된 기판에 케미컬을 분사하는 케미컬 분사구와 상기 케미컬 분사구에 의해 분사되는 케미컬에 의한 기판 처리 과정에서 발생하는 케미컬 퓸을 흡입하여 배출하는 퓸 배출구가 일체로 형성된 일체형 국소 노즐부 및 상기 일체형 국소 노즐부에 결합되어 상기 기판 처리 과정에서 발생하는 케미컬 퓸을 상기 퓸 배출구로 가이드하는 퓸 가이드 커버를 포함한다. 본 발명에 따르면, 반도체 공정의 에칭 또는 세정 과정에서 발생하는 케미컬 퓸을 일체형 국소 노즐을 이용하여 진공 흡입하여 외부로 배출시킴으로써 케미컬 퓸이 처리 용기 외부의 챔버 영역으로 확산되어 챔버 내부를 오염시키는 문제를 방지할 수 있고, 케미컬 퓸이 배출 과정에서 배출 경로에 위치하는 구성요소에 부착되는 문제를 방지할 수 있다.
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