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1. WO2020067638 - POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM USING SAME, AND ELECTRONIC DEVICE

Publication Number WO/2020/067638
Publication Date 02.04.2020
International Application No. PCT/KR2019/009112
International Filing Date 23.07.2019
IPC
G03F 7/039 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/022 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
CPC
G03F 7/022
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
G03F 7/039
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants
  • 삼성에스디아이 주식회사 SAMSUNG SDI CO., LTD. [KR]/[KR]
Inventors
  • 권지윤 KWON, Jiyun
  • 강진희 KANG, Jinhee
  • 김도욱 KIM, Do-Uk
  • 권장현 KWON, Chang-Hyun
  • 김상수 KIM, Sang Soo
  • 김이주 KIM, Ieju
  • 백택진 BAEK, Taek-Jin
Agents
  • 팬코리아특허법인 PANKOREA PATENT AND LAW FIRM
Priority Data
10-2018-011638328.09.2018KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM USING SAME, AND ELECTRONIC DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POSITIVE, FILM DE RÉSINE PHOTOSENSIBLE L'UTILISANT, ET DISPOSITIF ÉLECTRONIQUE
(KO) 포지티브형 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자
Abstract
(EN)
The present invention provides: a positive photosensitive resin composition comprising (A) an alkali-soluble resin, (B) a photosensitive diazoquinone compound, (C) a compound represented by a specific chemical formula, and (D) a solvent; a photosensitive resin film manufactured using same; and an electronic device comprising the photosensitive resin film.
(FR)
La présente invention concerne : une composition de résine photosensible positive comprenant (A) une résine soluble dans les alcalis, (B) un composé diazoquinone photosensible, (C) un composé représenté par une formule chimique spécifique, et (D) un solvant ; un film de résine photosensible fabriqué à l'aide de celle-ci; et un dispositif électronique comprenant le film de résine photosensible.
(KO)
(A) 알칼리 가용성 수지; (B) 감광성 디아조퀴논 화합물; (C) 특정 화학식으로 표시되는 화합물; 및 (D) 용매를 포함하는 포지티브형 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 전자 소자가 제공된다.
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