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1. WO2020066957 - SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

Publication Number WO/2020/066957
Publication Date 02.04.2020
International Application No. PCT/JP2019/037136
International Filing Date 20.09.2019
IPC
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
CPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
Applicants
  • JX金属株式会社 JX NIPPON MINING & METALS CORPORATION [JP]/[JP]
Inventors
  • 正能 大起 SHONO,Daiki
  • 村田 周平 MURATA,Shuhei
  • 岡部 岳夫 OKABE,Takeo
Agents
  • アクシス国際特許業務法人 AXIS PATENT INTERNATIONAL
Priority Data
2018-18053526.09.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
(FR) CIBLE DE PULVÉRISATION ET PROCÉDÉ DE FABRICATION DE CELLE-CI
(JA) スパッタリングターゲット及びその製造方法
Abstract
(EN)
Provided is a metal cylindrical sputtering target that reduces the amount of particles. The sputtering target is cylindrical, comprises at least a target material constituted from one or several metallic elements, and has a grain size or 50 μm or less and an oxygen concentration of 1000 mass ppm or less.
(FR)
L'invention concerne une cible de pulvérisation, laquelle est de forme cylindrique et constituée d'un matériau métallique et laquelle réduit le nombre de particules. Plus spécifiquement, cette cible de pulvérisation est de forme cylindrique et comporte au moins un matériau de cible, ce dernier étant constitué d'un ou de plusieurs éléments métalliques pour lesquels la taille de grain est inférieure ou égale à 50 μm et la concentration en oxygène est inférieure ou égale à 1000 ppm en masse.
(JA)
金属材料の円筒形スパッタリングターゲットであって、パーティクルを低減させたスパッタリングターゲットを提供すること。スパッタリングターゲットは、円筒形スパッタリングターゲットであって、スパッタリングターゲットは、ターゲット材を少なくとも備え、ターゲット材は、1又は複数の金属元素からなり、結晶粒径が50μm以下であり、酸素濃度が1000質量ppm以下である。
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