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1. WO2020064779 - CONTROLLED POLYMERIZATION OF A TARGET ZONE IN A PHOTOPOLYMERIZABLE MEDIUM

Publication Number WO/2020/064779
Publication Date 02.04.2020
International Application No. PCT/EP2019/075772
International Filing Date 24.09.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
B29C 64/393 2017.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
64Additive manufacturing, i.e. manufacturing of three-dimensional objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
30Auxiliary operations or equipment
386Data acquisition or data processing for additive manufacturing
393for controlling or regulating additive manufacturing processes
B33Y 10/00 2015.01
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
10Processes of additive manufacturing
B33Y 30/00 2015.01
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
30Apparatus for additive manufacturing; Details thereof or accessories therefor
CPC
B29C 64/393
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
64Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
30Auxiliary operations or equipment
386Data acquisition or data processing for additive manufacturing
393for controlling or regulating additive manufacturing processes
B33Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
10Processes of additive manufacturing
B33Y 30/00
BPERFORMING OPERATIONS; TRANSPORTING
33ADDITIVE MANUFACTURING TECHNOLOGY
YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
30Apparatus for additive manufacturing; Details thereof or accessories therefor
G03F 7/70416
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70416Stereolithography, 3D printing, rapid prototyping
Applicants
  • STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN [NL]/[NL]
Inventors
  • KOSTENKO, Alexander
Agents
  • DE VRIES & METMAN
Priority Data
18196384.424.09.2018EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) CONTROLLED POLYMERIZATION OF A TARGET ZONE IN A PHOTOPOLYMERIZABLE MEDIUM
(FR) POLYMÉRISATION CONTRÔLÉE D'UNE ZONE CIBLE DANS UN SUPPORT PHOTOPOLYMÉRISABLE
Abstract
(EN)
A method is described for controlled polymerization of a target zone in a photopolymerizable medium wherein the method comprises a processor connectable to an exposure system for illuminating a target zone in a photopolymerizable medium receiving a 3D data representation of a 3D model of an object and using the 3D model to determine a volume of the target zone, the volume being shaped according to the 3D model; the processor determining a target energy field E0 defining an energy for volume elements in the medium that is needed to achieve polymerization inside the target zone, the determining being based on a model of the polymerization process in the medium; the processor using the target energy field E0 and a light propagation model M to compute a solution I0 for the equation E0 = t . M[I0] wherein I0 is a direction-dependent illumination field needed for achieving energy deposition in the medium according to the target energy field E0 and t is the exposure time; and, the processor controlling the exposure system based on the direction-dependent illumination field I0, the exposure including generating a plurality of direction-dependent illumination beams to deposit energy within the target zone according to the target energy field E0.
(FR)
L'invention concerne un procédé de polymérisation contrôlée d'une zone cible dans un milieu photopolymérisable, le procédé comprenant un processeur pouvant être connecté à un système d'exposition servant à éclairer une zone cible dans un support photopolymérisable recevant d'un modèle 3D une représentation de données 3D d'un objet et utilisant le modèle 3D pour déterminer un volume de la zone cible, le volume étant formé selon le modèle 3D ; le processeur déterminant un champ d'énergie cible E 0 définissant une énergie pour des éléments de volume situés dans le support qui est nécessaire pour réaliser une polymérisation à l'intérieur de la zone cible, la détermination étant basée sur un modèle du processus de polymérisation dans le support ; le processeur utilisant le champ d'énergie cible E 0 et un modèle de propagation de lumière M pour calculer une solution I0 pour l'équation E 0 = t . M[I 0], où I 0 représente un champ d'éclairage qui est dépendant de la direction et qui est nécessaire pour réaliser un dépôt d'énergie dans le support selon le champ d'énergie cible E 0, et t représente le temps d'exposition ; et, le processeur commandant le système d'exposition sur la base du champ d'éclairage dépendant de la direction I 0, l'exposition comprenant la génération d'une pluralité de faisceaux d'éclairage dépendant de la direction pour déposer de l'énergie à l'intérieur de la zone cible selon le champ d'énergie cible E 0.
Also published as
Latest bibliographic data on file with the International Bureau