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1. WO2020064366 - PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY HAVING A MAGNETIC DAMPING ARRANGEMENT

Publication Number WO/2020/064366
Publication Date 02.04.2020
International Application No. PCT/EP2019/074491
International Filing Date 13.09.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
F16F 15/03 2006.01
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
FSPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
15Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
02Suppression of vibrations of non-rotating, e.g. reciprocating, systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating system
03using electromagnetic means
CPC
F16F 15/035
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
FSPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
15Suppression of vibrations in systems
02Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
03using ; magnetic or; electromagnetic means
035by use of eddy or induced-current damping
G03F 7/709
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
709Vibration, e.g. vibration detection, compensation, suppression
Applicants
  • CARL ZEISS SMT GMBH [DE]/[DE]
Inventors
  • MEINKUSS, Philipp
Agents
  • RAUNECKER, Klaus, Peter
Priority Data
10 2018 216 347.225.09.2018DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) PROJEKTIONSBELICHTUNGSANLAGE FÜR DIE HALBLEITERLITHOGRAPHIE MIT EINER MAGNETISCHEN DÄMPFUNGSANORDNUNG
(EN) PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY HAVING A MAGNETIC DAMPING ARRANGEMENT
(FR) SYSTÈME DE LITHOGRAPHIE PAR PROJECTION POUR LA LITHOGRAPHIE DE SEMI-CONDUCTEURS COMPORTANT UN DISPOSITIF D’AMORTISSEMENT MAGNÉTIQUE
Abstract
(DE)
Die Erfindung betrifft eine Projektionsbelichtungsanlage (1) für die Halbleiterlithographie mit mindestens einer Komponente, welche mit einer Dämpfungsanordnung (32) zur Dissipation mechanischer Schwingungsenergie versehen ist, wobei die Dämpfungsanordnung (32) ein mindestens teilweise von einem magnetischen Feld durchtretenes ferromagnetisches Element (35) umfasst, wobei die magnetische Flussdichte mindestens bereichsweise inhomogen ist und wobei das ferromagnetische Element (35) derart gelagert ist, dass es mit einer Bewegungskomponente in Richtung der Inhomogenität des magnetischen Feldes bewegbar ist.
(EN)
The invention relates to a projection exposure apparatus (1) for semiconductor lithography having at least one component which is provided with a damping arrangement (32) for dissipating mechanical vibration energy, the damping arrangement (32) comprising a ferromagnetic element (35) through at least part of which a magnetic field passes, the magnetic flux density being inhomogeneous at least in some regions, and the ferromagnetic element (35) being mounted in such a way that the ferromagnetic element can be moved by a movement component in the direction of the inhomogeneity of the magnetic field.
(FR)
L'invention concerne un système de lithographie par projection (1) pour la lithographie de semi-conducteurs, comportant au moins un composant pourvu d’un dispositif d’amortissement (32) pour dissiper de l’énergie vibratoire mécanique, le dispositif d’amortissement (32) comprenant un élément ferromagnétique (35) au moins partiellement traversé par un champ magnétique, la densité de flux magnétique étant hétérogène au moins par endroits et l’élément ferromagnétique (35) étant logé de telle manière qu’il peut être déplacé avec un composant de déplacement en direction de l’hétérogénéité du champ magnétique.
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