Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020064217 - LITHOGRAPHIC SYSTEM AND METHOD

Publication Number WO/2020/064217
Publication Date 02.04.2020
International Application No. PCT/EP2019/072112
International Filing Date 19.08.2019
IPC
G03F 1/62 2012.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 1/62
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
G03F 7/70916
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
G03F 7/70983
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70983Optical system protection, e.g. pellicles or removable covers for protection of mask
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • NIKIPELOV, Andrey
  • VAN DE KERKHOF, Marcus, Adrianus
  • CASIMIRI, Eric, Willem, Felix
  • SALVATORE, Stefano
Agents
  • FILIP, Diana
Priority Data
18197443.728.09.2018EP
18199853.511.10.2018EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) LITHOGRAPHIC SYSTEM AND METHOD
(FR) SYSTÈME ET PROCÉDÉ LITHOGRAPHIQUES
Abstract
(EN)
A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device configured to secure the particle to the pellicle membrane. The particle securement device is configured to direct the electron beam or the radiation beam such that the electron beam or the radiation beam passes through the pellicle membrane before being incident on the particle.
(FR)
L'invention concerne un système pour fixer une particule sur une membrane pelliculaire en vue d'une utilisation ultérieure dans un appareil lithographique, le système comprenant un dispositif de fixation de particule conçu pour fixer la particule à la membrane pelliculaire. Le dispositif de fixation de particule est conçu pour diriger le faisceau d'électrons ou le faisceau de rayonnement de telle sorte que le faisceau d'électrons ou le faisceau de rayonnement passe à travers la membrane pelliculaire avant d'arriver sur la particule.
Latest bibliographic data on file with the International Bureau