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1. WO2020064212 - PROVIDING A TRAINED NEURAL NETWORK AND DETERMINING A CHARACTERISTIC OF A PHYSICAL SYSTEM

Publication Number WO/2020/064212
Publication Date 02.04.2020
International Application No. PCT/EP2019/071874
International Filing Date 14.08.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G06N 3/04 2006.01
GPHYSICS
06COMPUTING; CALCULATING OR COUNTING
NCOMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
3Computer systems based on biological models
02using neural network models
04Architecture, e.g. interconnection topology
G06N 3/08 2006.01
GPHYSICS
06COMPUTING; CALCULATING OR COUNTING
NCOMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
3Computer systems based on biological models
02using neural network models
08Learning methods
CPC
G03F 7/70616
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
G03F 7/70625
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
70625Pattern dimensions, e.g. line width, profile, sidewall angle, edge roughness
G06N 3/0454
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
NCOMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
3Computer systems based on biological models
02using neural network models
04Architectures, e.g. interconnection topology
0454using a combination of multiple neural nets
G06N 3/08
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
NCOMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
3Computer systems based on biological models
02using neural network models
08Learning methods
G06N 3/082
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
NCOMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS
3Computer systems based on biological models
02using neural network models
08Learning methods
082modifying the architecture, e.g. adding or deleting nodes or connections, pruning
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • REHMAN, Samee, Ur
Agents
  • WILLEKENS, Jeroen Pieter Frank
Priority Data
18197556.628.09.2018EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PROVIDING A TRAINED NEURAL NETWORK AND DETERMINING A CHARACTERISTIC OF A PHYSICAL SYSTEM
(FR) UTILISATION D'UN RÉSEAU NEURONAL ENTRAÎNÉ ET DÉTERMINATION D'UNE CARACTÉRISTIQUE D'UN SYSTÈME PHYSIQUE
Abstract
(EN)
A method of determining a characteristic, such as optical response, of a physical system having a material structure, such as a thin-film multilayer stack or other optical system, has the steps: providing (1430) a neural network (1440) with its network architecture configured based on a model (1420) of scattering of radiation by the material structure along the radiation's path; training (1450) and using (1460) the neural network to determine the characteristic of the physical system. The network architecture may be configured based on the model by configuring parameters including number of units per hidden layer, number of hidden layers, layer interconnection and dropout.
(FR)
La présente invention concerne un procédé de détermination d'une caractéristique, une réponse optique, par exemple, d'un système physique ayant une structure matérielle comme une pile multicouche à film mince ou un autre système optique. Ce procédé comprend les étapes consistant à : utiliser (1430) un réseau neuronal (1440) dont l'architecture de réseau est configurée sur la base d'un modèle (1420) de diffusion de rayonnement par la structure de matériau le long du trajet du rayonnement ; entraîner (1450) et utiliser (1460) le réseau neuronal dans le but de déterminer la caractéristique du système physique. L'architecture de réseau peut être configurée sur la base du modèle en configurant des paramètres comme le nombre d'unités par couche cachée, le nombre de couches cachées, l'interconnexion de couches et l'exclusion.
Also published as
Latest bibliographic data on file with the International Bureau