Processing

Please wait...

Settings

Settings

Goto Application

1. WO2020062886 - DEVELOPING UNIT CLEANING DEVICE AND CLEANING METHOD USING SAME

Publication Number WO/2020/062886
Publication Date 02.04.2020
International Application No. PCT/CN2019/086740
International Filing Date 14.05.2019
IPC
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 7/42 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
42Stripping or agents therefor
G03F 7/30 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
30Imagewise removal using liquid means
B08B 9/08 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
9Cleaning hollow articles by methods or apparatus specially adapted thereto
08Cleaning of containers, e.g. tanks
CPC
B08B 9/08
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
9Cleaning hollow articles by methods or apparatus specially adapted thereto
08Cleaning containers, e.g. tanks
G02F 1/1303
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
1303Apparatus specially adapted to the manufacture of LCDs
G03F 7/7075
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
7075Handling workpieces outside exposure position, e.g. SMIF box
G03F 7/70925
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
70925Cleaning, i.e. actively freeing apparatus from pollutants
Applicants
  • 武汉华星光电技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 叶红 YE, Hong
Agents
  • 深圳翼盛智成知识产权事务所(普通合伙) ESSEN PATENT&TRADEMARK AGENCY
Priority Data
201811128282.827.09.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) DEVELOPING UNIT CLEANING DEVICE AND CLEANING METHOD USING SAME
(FR) DISPOSITIF DE NETTOYAGE D'UNITÉ DE DÉVELOPPEMENT ET PROCÉDÉ DE NETTOYAGE L'UTILISANT
(ZH) 显影单元清洁装置及采用该装置的清洁方法
Abstract
(EN)
Provided is a developing unit cleaning device (110) applied in an exposure system, the developing unit cleaning device is respectively connected to the substrate coating unit (120) and the substrate developing unit (140), the developing unit cleaning device is used to transfer the photoresist solvent waste liquid generated by the substrate coating unit to the substrate developing unit, and to clean the developing tank (141) provided in the substrate developing unit. The developing unit cleaning device effectively solves the problem that the cured photoresist residue inside the developing unit is not cleaned, improves the cleanliness of the developing tank of the developing unit, so as to avoid product defects caused by the cleanliness of the developing tank of the developing unit, meanwhile, the developing unit cleaning device can use the photoresist solvent for a second time, improving the utilization rate of chemical consumables.
(FR)
L'invention concerne un dispositif de nettoyage d'unité de développement (110) appliqué dans un système d'exposition, le dispositif de nettoyage d'unité de développement est respectivement connecté à l'unité de revêtement de substrat (120) et à l'unité de développement de substrat (140), le dispositif de nettoyage d'unité de développement est utilisé pour transférer le liquide résiduaire de solvant de résine photosensible généré par l'unité de revêtement de substrat à l'unité de développement de substrat, et pour nettoyer le réservoir de développement (141) disposé dans l'unité de développement de substrat. Le dispositif de nettoyage d'unité de développement résout efficacement le problème selon lequel le résidu de photorésine durcie à l'intérieur de l'unité de développement n'est pas nettoyé, améliore la propreté du réservoir de développement de l'unité de développement, de façon à éviter des défauts de produit provoqués par la propreté du réservoir de développement de l'unité de développement, et en même temps, le dispositif de nettoyage d'unité de développement peut utiliser le solvant de résine photosensible une seconde fois, en améliorant le taux d'utilisation de consommables chimiques.
(ZH)
一种应用于一曝光系统的显影单元清洁装置(110),显影单元清洁装置分别连接至基板涂布单元(120)和基板显影单元(140),显影单元清洁装置用于将基板涂布单元所产生的光阻溶剂废液传送至基板显影单元,并且对设置在基板显影单元中的显影槽(141)进行清洁。显影单元清洁装置有效地解决显影单元内部固化光阻残渣清洁不净的问题,提高了显影单元的显影槽的洁净度,从而避免因显影单元的显影槽的洁净度所引起的产品不良问题,同时这种显影单元清洁装置可以二次利用光阻溶剂,提升了化学消耗品的使用率。
Also published as
Latest bibliographic data on file with the International Bureau