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1. WO2020062455 - MEASUREMENT-BASED VALUE COMPENSATION METHOD FOR MASK, MASK, AND PREPARATION METHOD FOR MASK

Publication Number WO/2020/062455
Publication Date 02.04.2020
International Application No. PCT/CN2018/114425
International Filing Date 07.11.2018
IPC
G01F 1/84 2006.01
GPHYSICS
01MEASURING; TESTING
FMEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME
1Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through the meter in a continuous flow
76Devices for measuring mass flow of a fluid or a fluent solid material
78Direct mass flowmeters
80operating by measuring pressure, force, momentum, or frequency of a fluid flow to which a rotational movement has been imparted
84Coriolis or gyroscopic mass flowmeters
G01F 1/22 2006.01
GPHYSICS
01MEASURING; TESTING
FMEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME
1Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through the meter in a continuous flow
05by using mechanical effects
20by detection of dynamic effects of the fluid flow
22by variable-area meters
G01F 1/44 2006.01
GPHYSICS
01MEASURING; TESTING
FMEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL; METERING BY VOLUME
1Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through the meter in a continuous flow
05by using mechanical effects
34by measuring pressure or differential pressure
36the pressure or differential pressure being created by the use of flow constriction
40Details of construction of the flow constriction devices
44Venturi tubes
CPC
G03F 1/84
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68Preparation processes not covered by groups G03F1/20 - G03F1/50
82Auxiliary processes, e.g. cleaning or inspecting
84Inspecting
Applicants
  • 武汉华星光电技术有限公司 WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. [CN]/[CN]
Inventors
  • 张海杰 ZHANG, Haijie
  • 杨祖有 YANG, Zuyou
Agents
  • 深圳翼盛智成知识产权事务所(普通合伙) ESSEN PATENT&TRADEMARK AGENCY
Priority Data
201811154512.830.09.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) MEASUREMENT-BASED VALUE COMPENSATION METHOD FOR MASK, MASK, AND PREPARATION METHOD FOR MASK
(FR) PROCÉDÉ DE COMPENSATION DE VALEUR BASÉE SUR LA MESURE POUR MASQUE, MASQUE ET PROCÉDÉ DE PRÉPARATION DE MASQUE
(ZH) 一种掩膜版的量测补值方法、掩膜版及掩膜版的制备方法
Abstract
(EN)
A measurement-based value compensation method for a mask (100), the mask (100), and a preparation method for the mask (100). The method comprises: providing a mask (100), the mask (100) comprising a display region (101) and a reserved region (102), the reserved region (102) being provided with a length ruler (1021), and a plurality of first patterns (1011) being provided in the display region (101) according to a preset distance value (S); obtaining, on a glass substrate (200), a plurality of second patterns (2011) corresponding to the plurality of first patterns (1011), and acquiring an actual distance value (S1 or S2) between adjacent second patterns (2011); obtaining a compensation value (ΔS) according to the preset distance value (S) and the actual distance value (S1 or S2); and performing value compensation processing on the second patterns (2011) according to the compensation value (ΔS).
(FR)
L'invention concerne un procédé de compensation de valeur basée sur la mesure pour un masque (100), le masque (100), et un procédé de préparation du masque (100). Le procédé consiste à : fournir un masque (100), le masque (100) comprenant une région d'affichage (101) et une région réservée (102), la région réservée (102) comprenant une règle de longueur (1021), et une pluralité de premiers motifs (1011) étant disposés dans la région d'affichage (101) en fonction d'une valeur de distance prédéfinie (S); obtenir, sur un substrat en verre (200), une pluralité de seconds motifs (2011) correspondant à la pluralité de premiers motifs (1011), et acquérir une valeur de distance réelle (S1 ou S2) entre des seconds motifs adjacents (2011); obtenir une valeur de compensation (ΔS) en fonction de la valeur de distance prédéfinie (S) et de la valeur de distance réelle (S1 ou S2); et réaliser un traitement de compensation de valeur sur les seconds motifs (2011) en fonction de la valeur de compensation (ΔS).
(ZH)
掩膜版(100)的量测补值方法、掩膜版(100)以及掩膜版(100)的制备方法,包括:提供一掩膜版(100),其包括显示区(101)以及预留区(102),预留区(102)设置有长度尺(1021),根据预设距离值(S)在显示区(101)设置有多个第一图形(1011);在玻璃基板(200)上得到与多个第一图形(1011)对应的多个第二图形(2011),并获取相邻第二图形(2011)间的实际距离值(S1或S2);根据预设距离值(S)与实际距离值(S1或S2)得到补偿值(△S);根据补偿值(△S)对第二图形(2011)进行补值处理。
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