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1. WO2020007874 - PREPARATION OF 2,2,4,4-TETRASILYLPENTASILANE IN THE PRESENCE OF LEWIS ACIDS

Publication Number WO/2020/007874
Publication Date 09.01.2020
International Application No. PCT/EP2019/067762
International Filing Date 02.07.2019
IPC
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
B
NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
33
Silicon; Compounds thereof
04
Hydrides of silicon
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
C01B 33/04 (2006.01)
H01L 21/02 (2006.01)
CPC
C01B 33/04
C01B 33/046
H01L 21/02381
H01L 21/02532
H01L 21/02628
Applicants
  • EVONIK DEGUSSA GMBH [DE/DE]; Rellinghauser Straße 1-11 45128 Essen, DE
Inventors
  • STÜGER, Harald; AT
  • HAAS, Michael; AT
  • WUNNICKE, Odo; DE
  • MALSCH, Miriam Deborah; DE
  • HOLTHAUSEN, Michael; DE
Agents
  • EVONIK PATENT ASSOCIATION; c/o Evonik Industries AG / IP Management Bau 1042 A / PB 15 Paul-Baumann-Straße 1 45772 Marl, DE
Priority Data
18181980.605.07.2018EP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PREPARATION OF 2,2,4,4-TETRASILYLPENTASILANE IN THE PRESENCE OF LEWIS ACIDS
(FR) PRÉPARATION DE 2,2,4,4-TÉTRASILYLPENTASILANE EN PRÉSENCE D'ACIDES DE LEWIS
Abstract
(EN)
The present invention relates to a method of preparing 2,2,4,4- tetrasilylpentasilane in the presence of Lewis acids comprising an element of the 13th IUPAC group of the periodic table, a method of preparing semiconductor substrates as well as to the use of said Lewis acids for the catalysis of oligomerization of hydridosilanes in general.
(FR)
La présente invention concerne un procédé de préparation de 2,2,4,4-tétrasilylpentasilane en présence d'acides de Lewis, comprenant un élément du groupe 13 IUPAC du tableau périodique, un procédé de préparation de substrats semi-conducteurs ainsi que l'utilisation desdits acides de Lewis pour la catalyse d'oligomérisation d'hydridosilanes en général.
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