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1. WO2020004880 - SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Publication Number WO/2020/004880
Publication Date 02.01.2020
International Application No. PCT/KR2019/007603
International Filing Date 24.06.2019
IPC
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
H01L 21/687 (2006.01)
H01L 21/67 (2006.01)
H01L 21/02 (2006.01)
CPC
H01L 21/02
H01L 21/67
H01L 21/687
Applicants
  • 주성엔지니어링(주) JUSUNG ENGINEERING CO., LTD. [KR/KR]; 경기도 광주시 오포읍 오포로 240 240, Opo-ro, Opo-eup Gwangju-si Gyeonggi-do 12773, KR
Inventors
  • 김종식 KIM, Jong Sik; KR
  • 정구현 JUNG, Gu Hyun; KR
  • 정원우 JUNG, Won Woo; KR
Agents
  • 이승찬 LEE, Seung Chan; KR
Priority Data
10-2018-007268325.06.2018KR
Publication Language Korean (KO)
Filing Language Korean (KO)
Designated States
Title
(EN) SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
(FR) DISPOSITIF ET PROCÉDÉ DE TRAITEMENT DE SUBSTRAT
(KO) 기판 처리 장치 및 기판 처리 방법
Abstract
(EN)
A substrate processing device, according to one embodiment, comprises: a process chamber comprising a reaction space where at least one substrate is placed; a transfer chamber for mediating the transfer of the at least one substrate and the process chamber; and a buffer chamber having a rotation device for rotating the substrate by a predetermined angle. The rotation device may comprise: a rotational plate; a rotational shaft for rotating the rotational plate by the predetermined angle; a driving part for driving the rotational shaft; a control part for controlling the driving part; and a plurality of substrate holder parts arranged on top of the rotational plate and having the at least one substrate placed thereon.
(FR)
Un dispositif de traitement de substrat, selon un mode de réalisation, comprend : une chambre de traitement comprenant un espace de réaction dans lequel est placé au moins un substrat; une chambre de transfert pour assurer la médiation du transfert du ou des substrats et de la chambre de traitement; et une chambre tampon ayant un dispositif de rotation pour faire tourner le substrat d'un angle prédéterminé. Le dispositif de rotation peut comprendre : une plaque rotative; un arbre rotatif pour faire tourner la plaque rotative de l'angle prédéterminé; une partie d'entraînement pour entraîner l'arbre rotatif; une partie de commande pour commander la partie d'entraînement; et une pluralité de parties de support de substrat disposées sur la partie supérieure de la plaque rotative et sur lesquelles sont placés le ou les substrats.
(KO)
일 실시 예에 의한 기판 처리 장치는, 적어도 하나의 기판이 안치된 반응공간을 포함하는 공정 챔버; 상기 공정 챔버와 상기 적어도 하나의 기판의 이송을 중개하는 트랜스퍼 챔버; 및 상기 기판을 기 설정된 각도로 회전시키는 회전 장치가 구비된 버퍼 챔버를 포함하고, 상기 회전 장치는, 회전판; 상기 회전판을 상기 기 설정된 각도로 회전시키는 회전축; 상기 회전축을 구동하기 위한 구동부; 상기 구동부를 제어하기 위한 제어부; 및 상기 회전판 위에 배치되어 상기 적어도 하나의 기판을 안착시키는 복수의 기판 거치부를 포함할 수 있다.
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