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1. WO2020004062 - COMPOSITION FOR FORMING FLUORINE RESIN FILM

Publication Number WO/2020/004062
Publication Date 02.01.2020
International Application No. PCT/JP2019/023504
International Filing Date 13.06.2019
IPC
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
33
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Compositions of derivatives of such polymers
04
Homopolymers or copolymers of esters
14
of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
16
Homopolymers or copolymers of esters containing halogen atoms
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
22
Esters containing halogen
[IPC code unknown for C09D 7/20]
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
133
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
04
Homopolymers or copolymers of esters
14
of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
16
Homopolymers or copolymers of esters containing halogen atoms
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
C08L 33/16 (2006.01)
C08F 20/22 (2006.01)
C09D 7/20 (2018.01)
C09D 133/16 (2006.01)
C09K 3/00 (2006.01)
CPC
C08F 20/22
C08L 33/16
C09D 133/16
C09D 7/20
C09K 3/00
Applicants
  • セントラル硝子株式会社 CENTRAL GLASS COMPANY, LIMITED [JP/JP]; 山口県宇部市大字沖宇部5253番地 5253, Oaza Okiube, Ube-shi, Yamaguchi 7550001, JP
Inventors
  • 佐々木 佳子 SASAKI, Keiko; JP
  • 服部 啓太 HATTORI, Keita; JP
  • 宮澤 覚 MIYAZAWA, Satoru; JP
Agents
  • 小林 博通 KOBAYASHI, Hiromichi; JP
  • 富岡 潔 TOMIOKA, Kiyoshi; JP
  • 山口 幸二 YAMAGUCHI, Koji; JP
Priority Data
2018-12349928.06.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) COMPOSITION FOR FORMING FLUORINE RESIN FILM
(FR) COMPOSITION POUR FORMER UN FILM DE RÉSINE FLUORÉE
(JA) フッ素樹脂膜形成用組成物
Abstract
(EN)
A composition for forming a fluorine resin film according to one embodiment of the present invention is characterized by containing: more than 20% by mass but 40% by mass or less of a fluorine resin which contains, in the main chain, a (meth)acrylate structure that is composed of a repeating unit represented by formula (1), and which has a fluorine content of 30% by mass or more; from 0.1% by mass to 3.0% by mass (inclusive) of a specific non-fluorine solvent; and a fluorine solvent which has a fluorine content of 30% by mass or more. This composition for forming a fluorine resin film has an advantage such that the composition is in a homogeneous phase and has a low viscosity even if the fluorine resin is at a high concentration. (In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a linear hydrocarbon group having 1-15 carbon atoms, a branched hydrocarbon group having 3-15 carbon atoms, or a cyclic hydrocarbon group having 3-15 carbon atoms; an arbitrary number of hydrogen atoms in the hydrocarbon group are substituted by fluorine atoms; and the fluorine content in the repeating unit is 30% by mass or more.)
(FR)
La présente invention concerne une composition pour former un film de résine fluorée qui, selon un mode de réalisation de la présente invention, est caractérisée en ce qu'elle contient : plus de 20 % en masse mais au plus 40 % en masse d'une résine fluorée qui contient, dans la chaîne principale, une structure de (méth) acrylate qui est composée d'une unité recurrente représentée par la formule (1), et qui a une teneur en fluor de 30 % en masse ou plus ; de 0,1 % en masse à 3,0 % en masse (inclus) d'un solvant non fluoré spécifique ; et d'un solvant fluoré qui a une teneur en fluor de 30 % en masse ou plus. Cette composition pour former un film de résine fluorée présente un avantage tel que la composition est dans une phase homogène et présente une faible viscosité même si la résine fluorée est présente en une concentration élevée. (Dans la formule, R1 représente un atome d'hydrogène ou un groupe méthyle ; R2 représente un groupe hydrocarboné linéaire ayant 1 à 15 atomes de carbone, un groupe hydrocarboné ramifié ayant 3 à 15 atomes de carbone, ou un groupe hydrocarboné cyclique ayant 3 à 15 atomes de carbone ; un nombre arbitraire d'atomes d'hydrogène dans le groupe hydrocarboné sont substitués par des atomes de fluor ; et la teneur en fluor dans l'unité récurrente est de 30 % en masse ou plus.)
(JA)
本発明の実施形態に係るフッ素樹脂膜形成用組成物は、主鎖に式(1)で表される繰り返し単位からなる(メタ)アクリレート構造を含み、フッ素含有率が30質量%以上であるフッ素樹脂を20質量%超40質量%以下と、特定の非フッ素溶剤を0.1質量%以上3.0質量%以下と、フッ素含有率が30質量%以上であるフッ素溶剤と、を含有することを特徴とする。該フッ素樹脂膜形成用組成物は、フッ素樹脂が高濃度であっても均一相であり、かつ、低粘度であるという利点を有する。(式中、R1は、水素原子またはメチル基を表し、R2は、炭素数1~15の直鎖状、炭素数3~15の分岐鎖状または炭素数3~15の環状の炭化水素基を表し、該炭化水素基中の任意の数の水素原子がフッ素原子で置換されており、繰り返し単位中のフッ素含有率は30質量%以上である。)
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