Processing

Please wait...

Settings

Settings

1. WO2020004035 - POSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

Publication Number WO/2020/004035
Publication Date 02.01.2020
International Application No. PCT/JP2019/023255
International Filing Date 12.06.2019
IPC
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
N
PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1
Printing plates or foils; Materials therefor
12
non-metallic other than stone
14
Lithographic printing foils
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
34
Esters containing nitrogen
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
095
having more than one photosensitive layer
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G03F 7/033 (2006.01)
B41N 1/14 (2006.01)
C08F 220/02 (2006.01)
C08F 220/34 (2006.01)
G03F 7/00 (2006.01)
G03F 7/004 (2006.01)
CPC
B41N 1/14
C08F 220/02
C08F 220/34
G03F 7/00
G03F 7/004
G03F 7/033
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors
  • 小山 一郎 KOYAMA, Ichiro; JP
  • 栢木 加奈 KAYAKI, Kana; JP
Agents
  • 特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data
2018-12253127.06.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) POSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
(FR) PRÉCURSEUR POSITIF DE PLAQUE D'IMPRESSION LITHOGRAPHIQUE, PROCÉDÉ DE PRODUCTION DE PLAQUE D'IMPRESSION LITHOGRAPHIQUE ET COMPOSITION DE RÉSINE PHOTOSENSIBLE POSITIVE
(JA) ポジ型平版印刷版原版、平版印刷版の作製方法及びポジ型感光性樹脂組成物
Abstract
(EN)
Provided is a positive lithographic printing plate precursor having a support, and an image recording layer formed on the support, wherein the image recording layer includes a structural unit having an acid group having a pKa of 7 or less, and a structural unit having a base group, wherein the precursor contains: a binder polymer which is an addition polymerization-type resin in which at least one among the acid group of the structural unit having the acid group and the base group of the structural unit having the base group binds to a main chain via a linking group; and an infrared absorber. Also provided are a positive photosensitive resin composition, and a method for producing a lithographic printing plate using the positive lithographic printing plate precursor.
(FR)
L'invention concerne un précurseur positif de plaque d'impression lithographique ayant un support et une couche d'enregistrement d'image formée sur le support, la couche d'enregistrement d'image comprenant une unité structurale ayant un groupe acide ayant un pKa de 7 ou moins, et une unité structurale ayant un groupe basique, le précurseur contenant : un polymère liant qui est une résine de type polymérisation par addition dans laquelle au moins l'un des groupes que sont le groupe acide de l'unité structurale ayant le groupe acide et le groupe basique de l'unité structurale ayant le groupe basique se lie à une chaîne principale par l'intermédiaire d'un groupe de liaison ; et un absorbeur d'infrarouges. L'invention concerne également une composition de résine photosensible positive et un procédé de production d'une plaque d'impression lithographique utilisant le précurseur positif de plaque d'impression lithographique.
(JA)
支持体と、支持体上に形成された画像記録層と、を有し、上記画像記録層が、pKaが7以下である酸基を有する構成単位と塩基基を有する構成単位とを含み、上記酸基を有する構成単位の酸基及び上記塩基基を有する構成単位の塩基基の少なくとも一方が連結基を介して主鎖に結合した付加重合型樹脂である、バインダーポリマーと、赤外線吸収剤と、を含む、ポジ型平版印刷版原版、及び、ポジ型感光性樹脂組成物、並びに、上記ポジ型平版印刷版原版を用いた平版印刷版の作製方法。
Latest bibliographic data on file with the International Bureau