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1. WO2020003946 - DEPOSITED FILM AND METHOD FOR PRODUCING DEPOSITED FILM

Publication Number WO/2020/003946
Publication Date 02.01.2020
International Application No. PCT/JP2019/022390
International Filing Date 05.06.2019
Chapter 2 Demand Filed 16.01.2020
IPC
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
02
Pretreatment of the material to be coated
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
C23C 14/02 (2006.01)
B32B 9/00 (2006.01)
CPC
B32B 9/00
C23C 14/02
Applicants
  • 尾池工業株式会社 OIKE & CO., LTD. [JP/JP]; 京都府京都市下京区仏光寺通西洞院西入木賊山町181番地 181, Tokusayama-cho, Nishinotoin Nishi-iru, Bukkoji-dori, Shimogyo-ku, Kyoto-shi, Kyoto 6008461, JP
Inventors
  • 大西 潤 OHNISHI, Jun; JP
  • 有村 直美 ARIMURA, Naomi; JP
Agents
  • 特許業務法人朝日奈特許事務所 ASAHINA & CO.; 大阪府大阪市中央区谷町二丁目2番22号 NSビル NS Building, 2-22, Tanimachi 2-chome, Chuo-ku, Osaka-shi, Osaka 5400012, JP
Priority Data
2018-11988025.06.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) DEPOSITED FILM AND METHOD FOR PRODUCING DEPOSITED FILM
(FR) FILM DÉPOSÉ ET SON PROCÉDÉ DE PRODUCTION
(JA) 蒸着フィルムおよび蒸着フィルムの製造方法
Abstract
(EN)
A deposited film comprising a base material and a deposited layer provided on the base material, wherein the deposited layer contains a metal and has an average oxygen atom concentration, which is measured by X-ray photoelectron spectroscopy in the thickness direction, of 8.0 at.% or less.
(FR)
La présente invention concerne un film déposé qui comprend un matériau de base et une couche déposée disposée sur le matériau de base, la couche déposée contenant un métal et ayant une concentration moyenne en atomes d'oxygène, qui est mesurée par spectroscopie photoélectronique à rayons X dans le sens de l'épaisseur, inférieure ou égale à 8,0 % at.
(JA)
基材と、基材上に設けられた蒸着層とを備え、蒸着層は、金属を含み、厚み方向におけるX線光電子分光法によって測定される酸素原子の平均濃度が、8.0原子%以下である、蒸着フィルム。
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