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1. WO2020003795 - OPENING/CLOSING VALVE AND SUBSTRATE PROCESSING DEVICE PROVIDED WITH SAID OPENING/CLOSING VALVE

Publication Number WO/2020/003795
Publication Date 02.01.2020
International Application No. PCT/JP2019/019506
International Filing Date 16.05.2019
IPC
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
31
Operating means; Releasing devices
02
electric; magnetic
06
using a magnet
08
using a permanent magnet
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
K
VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
31
Operating means; Releasing devices
02
electric; magnetic
06
using a magnet
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
304
Mechanical treatment, e.g. grinding, polishing, cutting
F16K 31/08 (2006.01)
F16K 31/06 (2006.01)
H01L 21/304 (2006.01)
CPC
F16K 31/06
F16K 31/08
H01L 21/304
Applicants
  • 株式会社SCREENホールディングス SCREEN HOLDINGS CO., LTD. [JP/JP]; 京都府京都市上京区堀川通寺之内上る4丁目天神北町1番地の1 Tenjinkita-machi 1-1, Teranouchi-agaru 4-chome, Horikawa-dori, Kamigyo-ku, Kyoto-shi, Kyoto 6028585, JP
Inventors
  • 楠原 充也 KUSUHARA Mitsuya; JP
Agents
  • 杉谷 勉 SUGITANI Tsutomu; JP
Priority Data
2018-12492229.06.2018JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) OPENING/CLOSING VALVE AND SUBSTRATE PROCESSING DEVICE PROVIDED WITH SAID OPENING/CLOSING VALVE
(FR) SOUPAPE D'OUVERTURE/FERMETURE ET DISPOSITIF DE TRAITEMENT DE SUBSTRAT ÉQUIPÉ DE LADITE SOUPAPE D'OUVERTURE/FERMETURE
(JA) 開閉弁およびこの開閉弁を備えた基板処理装置
Abstract
(EN)
In this opening/closing valve (9), a valve body-side electromagnet part (43) is provided on the valve body (41) side, and a permanent magnet part (36) is provided on a valve seat (35) side. When a current supply circuit (11) supplies a first direction current to the valve body-side electromagnet part (43), the valve body-side electromagnet part (43) generates a magnetic field. Therefore, the valve body-side electromagnet part (43) is pulled toward the permanent magnet part (36). In other words, forces due to the magnetic field, which pulls the valve body (41) and the valve seat (35) toward each other, act upon the valve body (41) and the valve seat (35). Accordingly, the valve body (41) approaches the valve seat part (35) and is pressed against the valve seat part (35). In addition, the valve body (41) can be pressed against the valve seat part (35) uniformly in the circumferential direction of the valve seat part (35). Thus, contact between the valve body (41) and the valve seat part (35) can be reliably achieved, and the occurrence of leaks can be prevented.
(FR)
Dans cette soupape d'ouverture/fermeture (9), une partie électroaimant côté corps de soupape (43) est disposée sur le côté corps de soupape (41), et une partie aimant permanent (36) est disposée sur un côté siège de soupape (35). Lorsqu'un circuit d'alimentation en courant (11) fournit un premier courant de direction à la partie électroaimant côté corps de soupape (43), la partie électroaimant côté corps de soupape (43) génère un champ magnétique. Par conséquent, la partie électroaimant côté corps de soupape (43) est tirée vers la partie aimant permanent (36). En d'autres termes, les forces dues au champ magnétique, qui tire le corps de soupape (41) et le siège de soupape (35) l'un vers l'autre, agissent sur le corps de soupape (41) et le siège de soupape (35). En conséquence, le corps de soupape (41) s'approche de la partie siège de soupape (35) et est pressé contre la partie siège de soupape (35). De plus, le corps de soupape (41) peut être pressé contre la partie siège de soupape (35) uniformément dans la direction circonférentielle de la partie de siège de soupape (35). Ainsi, le contact entre le corps de soupape (41) et la partie siège de soupape (35) peut être obtenu de manière fiable, et l'apparition de fuites peut être empêchée.
(JA)
開閉弁(9)において、弁体(41)側には弁体側電磁石部(43)が設けられ、弁座部(35)側には永久磁石部(36)が設けられている。電流供給回路(11)が弁体側電磁石部(43)に第1方向の電流を供給すると、弁体側電磁石部(43)は磁界を生成する。そのため、弁体側電磁石部(43)は、永久磁石部(36)に引き付けられる。すなわち、弁体(41)と弁座部(35)には、磁界による引き付け合う力が働く。これにより、弁座部(35)に弁体(41)が近づけられ、弁座部(35)に弁体(41)が押し付けられる。また、弁座部(35)の周方向に均一に弁体(41)を弁座部(35)に押し付けることができる。これにより、弁体(41)と弁座部(35)との接触を確実にすることができ、リーク発生を防止することができる。
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