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1. WO2020001775 - COMPONENT FOR A VACUUM CHAMBER, VACUUM CHAMBER, AND METHOD OF MANUFACTURING A DEGASSING HOLE

Publication Number WO/2020/001775
Publication Date 02.01.2020
International Application No. PCT/EP2018/067434
International Filing Date 28.06.2018
IPC
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H01J 37/32 (2006.01)
H01J 37/34 (2006.01)
C23C 16/44 (2006.01)
G03F 7/20 (2006.01)
CPC
B01J 3/002
C23C 16/4401
C23C 16/4408
C23C 16/4412
G03F 7/70841
H01J 37/32807
Applicants
  • APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
  • HEIMEL, Oliver [DE/DE]; DE (US)
  • HINTERSCHUSTER, Reiner [DE/DE]; DE (US)
Inventors
  • HEIMEL, Oliver; DE
  • HINTERSCHUSTER, Reiner; DE
Agents
  • ZIMMERMANN & PARTNER PATENTANWÄLTE MBB; Josephspitalstr. 15 80331 München, DE
Priority Data
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) COMPONENT FOR A VACUUM CHAMBER, VACUUM CHAMBER, AND METHOD OF MANUFACTURING A DEGASSING HOLE
(FR) COMPOSANT POUR UNE CHAMBRE À VIDE, CHAMBRE À VIDE ET PROCÉDÉ DE FABRICATION D'UN TROU DE DÉGAZAGE
Abstract
(EN)
A component (502) for a vacuum chamber (500) is described. The component includes a first surface (232) and a blind hole (210) provided in the first surface. The component further includes a degassing hole (220) provided in the first surface and partially overlapping with the blind hole.
(FR)
Un composant (502) pour une chambre à vide (500) est décrit. Le composant comporte une première surface (232) et un trou borgne (210) situé dans la première surface. Le composant comprend en outre un trou de dégazage (220) situé dans la première surface et chevauchant partiellement le trou borgne.
Latest bibliographic data on file with the International Bureau