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1. (WO2020001751) MAGNETIC LEVITATION SYSTEM FOR TRANSPORTING A CARRIER, CARRIER FOR A MAGNETIC LEVITATION SYSTEM, APPARATUS FOR TRANSPORTATION OF A CARRIER, PROCESSING SYSTEM FOR VERTICALLY PROCESSING A SUBSTRATE, AND METHOD OF SWITCHING A TRANSPORT PATH OF A CARRIER
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2020/001751 International Application No.: PCT/EP2018/067110
Publication Date: 02.01.2020 International Filing Date: 26.06.2018
IPC:
C23C 14/50 (2006.01) ,B65G 49/07 (2006.01) ,C23C 14/56 (2006.01) ,H01J 37/32 (2006.01) ,H01L 21/67 (2006.01) ,H01L 21/677 (2006.01) ,H01L 21/687 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
50
Substrate holders
B PERFORMING OPERATIONS; TRANSPORTING
65
CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
G
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
49
Conveying systems characterised by their application for specified purposes not otherwise provided for
05
for fragile or damageable materials or articles
07
for semiconductor wafers
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California, 95054, US
HEIMEL, Oliver [DE/DE]; DE (US)
EHMANN, Christian Wolfgang [DE/DE]; DE (US)
LINDENBERG, Ralph [DE/DE]; DE (US)
Inventors:
HEIMEL, Oliver; DE
EHMANN, Christian Wolfgang; DE
LINDENBERG, Ralph; DE
Agent:
ZIMMERMANN & PARTNER PATENTANWÄLTE MBB; Josephspitalstr. 15 80331 München, DE
Priority Data:
Title (EN) MAGNETIC LEVITATION SYSTEM FOR TRANSPORTING A CARRIER, CARRIER FOR A MAGNETIC LEVITATION SYSTEM, APPARATUS FOR TRANSPORTATION OF A CARRIER, PROCESSING SYSTEM FOR VERTICALLY PROCESSING A SUBSTRATE, AND METHOD OF SWITCHING A TRANSPORT PATH OF A CARRIER
(FR) SYSTÈME DE LÉVITATION MAGNÉTIQUE POUR TRANSPORTER UN SUPPORT, SUPPORT POUR SYSTÈME DE LÉVITATION MAGNÉTIQUE, SYSTÈME DE TRAITEMENT POUR LE TRAITEMENT VERTICAL D'UN SUBSTRAT, ET PROCÉDÉ DE COMMUTATION D'UN CHEMIN DE TRANSPORT D'UN SUPPORT
Abstract:
(EN) A magnetic levitation system (100) for transporting a carrier (10) in a transport direction (T) is described. The magnetic levitation system includes one or more magnetic bearings (120) having one or more first actuators (121) for contactlessly holding the carrier (10) in a carrier transportation space (15). The one or more first actuators (121) are arranged above the carrier transportation space (15). Additionally, the magnetic levitation system includes a drive unit (130) having one or more second actuators (132) for moving the carrier (10) in the transport direction (T). The one or more second actuators (132) are laterally arranged on a lower portion (15L) of the carrier transportation space (15).
(FR) L'invention concerne un système de lévitation magnétique (100) permettant de transporter un support (10) dans une direction de transport (T). Le système de lévitation magnétique comprend des paliers magnétiques (120) ayant un ou plusieurs premiers actionneurs (121) permettant de maintenir sans contact le support (10) dans un espace de transport de support (15). Le ou les premiers actionneurs (121) sont disposés au-dessus de l'espace de transport de support (15). De plus, le système de lévitation magnétique comprend une unité d'entraînement (130) ayant un ou plusieurs seconds actionneurs (132) permettant de déplacer le support (10) dans la direction de transport (T). Le ou les seconds actionneurs (132) sont disposés latéralement sur une partie inférieure (15L) de L'espace de transport de support (15).
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)