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1. (WO2020001571) SYSTEM AND METHOD FOR RADIATION EXPOSURE CONTROL
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2020/001571 International Application No.: PCT/CN2019/093406
Publication Date: 02.01.2020 International Filing Date: 27.06.2019
IPC:
G01N 23/04 (2018.01)
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23
Investigating or analysing materials by the use of wave or particle radiation not covered by group G01N21/ or G01N22/159
02
by transmitting the radiation through the material
04
and forming a picture
Applicants:
SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD. [CN/CN]; No. 2258 Chengbei Road, Jiading District Shanghai 201807, CN
Inventors:
LIANG, Kan; CN
LI, Wei; CN
TANG, Dingche; CN
WANG, Yan; CN
Agent:
METIS IP (CHENGDU) LLC; Room 808, 8th Floor, Building B7, Block D Tianfu Jingrong Center, No. 99 West Section of Hupan Road Tianfu New District Chengdu, Sichuan 610213, CN
Priority Data:
201810676483.527.06.2018CN
Title (EN) SYSTEM AND METHOD FOR RADIATION EXPOSURE CONTROL
(FR) SYSTÈME ET PROCÉDÉ DE COMMANDE D'UNE EXPOSITION À UN RAYONNEMENT
Abstract:
(EN) A system and method for controlling a radiation exposure on a subject. The method includes obtaining exposure instructions including an exposure state of an imaging device. The method also includes determining first components associated with the imaging device and one or more target operations of the first components corresponding to the exposure state. The method further includes generating target operation instructions based on the one or more target operations of the first components. The method still further includes controlling the first components to implement the target operation instructions.
(FR) L'invention concerne un système et un procédé de commande d'une exposition à un rayonnement sur un sujet. Le procédé consiste à obtenir des instructions d'exposition comprenant un état d'exposition d'un dispositif d'imagerie. Le procédé consiste également à déterminer des premiers composants associés au dispositif d'imagerie et une ou plusieurs opérations cibles des premiers composants correspondant à l'état d'exposition. Le procédé consiste en outre à générer des instructions d'opérations cibles sur la base de l'opération ou des opérations cibles des premiers composants. Le procédé consiste encore en outre à commander aux premiers composants d'implémenter les instructions d'opérations cibles.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)