PATENTSCOPE will be unavailable a few hours for maintenance reason on Monday 03.02.2020 at 10:00 AM CET
Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2020000185) SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING WITH REDUCED INTERNAL STRESSES
Latest bibliographic data on file with the International BureauSubmit observation

Pub. No.: WO/2020/000185 International Application No.: PCT/CN2018/092888
Publication Date: 02.01.2020 International Filing Date: 26.06.2018
IPC:
H01L 51/56 (2006.01) ,C23C 14/04 (2006.01) ,C25D 1/10 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
56
Processes or apparatus specially adapted for the manufacture or treatment of such devices or of parts thereof
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
04
Coating on selected surface areas, e.g. using masks
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
1
Electroforming
10
Moulds; Masks; Masterforms
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, California 95054, US
HUANG, Xi [CN/CN]; CN (KP)
Inventors:
HUANG, Xi; CN
KWAK, Byung-Sung; US
BENCHER, Christopher Dennis; US
HAAS, Dieter; DE
LASSITER, Brian E.; US
Agent:
LECOME INTELLECTUAL PROPERTY AGENT LTD.; Floor 16, Tower B of In.Do Mansion No. 48-Jia Zhichun Road, Haidian District Beijing 100098, CN
Priority Data:
Title (EN) SHADOW MASK WITH TAPERED OPENINGS FORMED BY DOUBLE ELECTROFORMING WITH REDUCED INTERNAL STRESSES
(FR) MASQUE PERFORÉ À OUVERTURES CONIQUES FORMÉ PAR DOUBLE ÉLECTROFORMAGE À L'AIDE DE PHOTORÉSINES POSITIVES/NÉGATIVES
Abstract:
(EN) Embodiments of the disclosure provide methods and apparatus for a shadow mask. In one embodiment, a shadow mask is provided and includes a frame made of a metallic material, and one or more mask patterns coupled to the frame, the one or more mask patterns comprising a metal having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings formed therein, the metal having a thickness of about 5 microns to about 50 microns and having borders formed therein each defining a fine opening having a recessed surface formed on a substrate contact surface thereof, wherein each of the one or more mask patterns have a flatness of less than about 150 microns across a surface area of about 70,000 square millimeters.
(FR) Des modes de réalisation de l'invention concernent des procédés et un appareil se rapportant à un masque perforé. La présente invention concerne un masque perforé qui comprend un cadre constitué d'un matériau métallique, et un ou plusieurs motifs de masque couplés au cadre, le ou les motifs de masque comprenant un métal présentant un coefficient de dilatation thermique inférieur ou égal à environ 14 microns/mètre/degré Celsius et présentant une pluralité d'ouvertures formées dans ledit cadre, le métal ayant une épaisseur d'environ 5 microns à environ 50 microns et ayant des bordures formées à l'intérieur et définissant chacune une ouverture fine présentant une surface évidée formée sur une surface de contact avec le substrat (150) de celle-ci, le masque ou chacun des motifs de masque ayant une planéité inférieure à environ 150 microns au niveau d'une zone de surface d'environ 70,000 millimètres carrés.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)